Chinese Journal of Lasers, Volume. 30, Issue s1, 43(2003)
Influence of Photoelectronics’ Behavior on the Photosensitive Process of Imaging Materials
[2] [2] J. W. Mitcheii. The basic concepts of the photoaggregation theory [J]. J. Imag. Set. Technol., 1995, 39(3):193-203
[3] [3] Τ. H. Mussing. Principles of microwave absorption technique applied to AgX micro crystals [J],.J. Imag. Sci. Technol., 1997, 41(2):118-122
[4] [4] R. K. Hailstone. Computer simulation of the effect of grain size on the efficiency of latent-image formation[J]. J. Imag. Sci. Technol., 1995,39(5):407-418
[5] [5] D. Hertel, U. Siemen. Computer simulation of photon propagation in photographic emulsion layers [J]. J. Photographic Science, 1996’ 44:2-8
[6] [6] R. W. Gurncy, N. F. Mott. Theory of the photolysis of silver bromide and the photographic latent image [J]. Proc. Roy. Soc. London, 1983, 164(A): 151
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LI Xiao-wei, SUN Yu-chen, DONG Li-fang, Yu Wei, Han Li. Influence of Photoelectronics’ Behavior on the Photosensitive Process of Imaging Materials[J]. Chinese Journal of Lasers, 2003, 30(s1): 43
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Published Online: Jan. 29, 2013
The Author Email: LI Xiao-wei (laser@mail.hbu.edu.cn)
CSTR:32186.14.