Chinese Journal of Lasers, Volume. 30, Issue s1, 43(2003)

Influence of Photoelectronics’ Behavior on the Photosensitive Process of Imaging Materials

LI Xiao-wei*, SUN Yu-chen, DONG Li-fang, Yu Wei, and Han Li
Author Affiliations
  • [in Chinese]
  • show less
    References(5)

    [2] [2] J. W. Mitcheii. The basic concepts of the photoaggregation theory [J]. J. Imag. Set. Technol., 1995, 39(3):193-203

    [3] [3] Τ. H. Mussing. Principles of microwave absorption technique applied to AgX micro crystals [J],.J. Imag. Sci. Technol., 1997, 41(2):118-122

    [4] [4] R. K. Hailstone. Computer simulation of the effect of grain size on the efficiency of latent-image formation[J]. J. Imag. Sci. Technol., 1995,39(5):407-418

    [5] [5] D. Hertel, U. Siemen. Computer simulation of photon propagation in photographic emulsion layers [J]. J. Photographic Science, 1996’ 44:2-8

    [6] [6] R. W. Gurncy, N. F. Mott. Theory of the photolysis of silver bromide and the photographic latent image [J]. Proc. Roy. Soc. London, 1983, 164(A): 151

    Tools

    Get Citation

    Copy Citation Text

    LI Xiao-wei, SUN Yu-chen, DONG Li-fang, Yu Wei, Han Li. Influence of Photoelectronics’ Behavior on the Photosensitive Process of Imaging Materials[J]. Chinese Journal of Lasers, 2003, 30(s1): 43

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: --

    Accepted: --

    Published Online: Jan. 29, 2013

    The Author Email: LI Xiao-wei (laser@mail.hbu.edu.cn)

    DOI:

    CSTR:32186.14.

    Topics