Chinese Journal of Lasers, Volume. 30, Issue s1, 43(2003)
Influence of Photoelectronics’ Behavior on the Photosensitive Process of Imaging Materials
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LI Xiao-wei, SUN Yu-chen, DONG Li-fang, Yu Wei, Han Li. Influence of Photoelectronics’ Behavior on the Photosensitive Process of Imaging Materials[J]. Chinese Journal of Lasers, 2003, 30(s1): 43
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Received: --
Accepted: --
Published Online: Jan. 29, 2013
The Author Email: Xiao-wei LI (laser@mail.hbu.edu.cn)
CSTR:32186.14.
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