[1] [1] A. J. Hazelton, K. Shiraishi, S. Wakamoto et al.. Recent performance results of Nikon immersion lithography tools［C］. SPIE, 2008, 6924: 69241N

[2] [2] Li Yanqiu. Optical performance of extreme-ultraviolet lithography for 50 nm generation［J］. Acta Optica Sinica, 2004, 24(7): 865～868

[3] [3] Ma Bin, Li Lin, Chang Jun et al.. Refractive projection lens for 90 nm resolution lithography［J］. Acta Optica Sinica, 2009, 29(s2): 211～215

[4] [4] Zhou Yuan, Li Yanqiu. Optimization of topside antireflective coatings for hyper numerical aperture lithography［J］. Acta Optica Sinica, 2008, 28(2): 337～343

[5] [5] Zhou Yuan, Li Yanqiu. Optimization of double bottom antireflective coating for hyper numerical aperture lithography［J］. Acta Optica Sinica, 2008, 28(3): 472～477

[6] [6] Zhou Yuan, Li Yanqiu. Bulk effects in hyper-numerical aperture optical lithography［J］. Acta Optica Sinica, 2008, 28(6): 1091～1095

[7] [7] B. W. Smith, A. Bourov, Y. Fan et al.. Approaching the numerical aperture of water-immersion lithography at 193 nm［C］. SPIE, 2004, 5377: 273～284

[8] [8] J. Zhou, Y. Fan, B. W. Smith. Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography［C］. SPIE, 2006, 6154: U2561～U2567

[9] [9] B. W. Smith, H. Kang, A. Bourov et al.. Water immersion optical lithography for 45-nm node［C］. SPIE, 2003, 5040: 679～689

[10] [10] A. K. Raub, S. R. J. Brueck. Deep UV immersion interferometric lithography［C］. SPIE, 2003, 5040: 667～678

[11] [11] J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez et al.. Liquid immersion deep-ultraviolet interferometric lithography［J］. J. Vac. Sci. Technol. B, 1999, 17(6): 3306～3309

[12] [12] B. W. Smith, A. Bourov, Y. Fan et al.. Amphibian XIS: an immersion lithography microstepper platform［C］. SPIE, 2004, 5754: 751～759

[13] [13] E. Hendrickx, M. O. Beeck, R. Gronheid et al.. Early learning on hyper-NA lithography using two-beam immersion interference［C］. SPIE, 2006, 6154: U1161～U1169

[14] [14] A. L. Charley, A. Lagrange, O. Lartigue et al.. Liquid immersion lithography at 193 nm using a high-NA achromatic interferometer［C］. SPIE, 2006, 6154: 61541～61549

[15] [15] A. L. Charley, A. Lagrange, O. Lartigue et al.. Hyper high numerical aperature achromatic interferometer for immersion lithography at 193 nm［J］. J. Vac. Sci. Technol. B, 2005, 23(6): 2668～2674

[16] [16] Liao Feihong, Li Xiaoping, Chen Xuedong et al.. Probe spot position error on the accuracy of focusing and leveling measurement system [J]. Acta Optica Sinica, 2010, 30(4): 1041～1045