Infrared and Laser Engineering, Volume. 54, Issue 3, 20240502(2025)

Investigation of diffraction characteristics in stitched atomic lithography grating

Yize WU1, Dongbai XUE2,3,4,5,6,7、*, Guangxu XIAO2,3,4,5,6,7, Junyu SHEN2,3,4,5,6,7, Xiao DENG2,3,4,5,6,7, and Ming KONG1
Author Affiliations
  • 1College of Metrology & Measurement Instrumentation, China Jiliang University, Hangzhou 310018, China
  • 2National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University, Shanghai 200092, China
  • 3Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China
  • 4MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai 200092, China
  • 5Shanghai Frontiers Science Center of Digital Optics, Tongji University, Shanghai 200092, China
  • 6Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University, Shanghai 200092, China
  • 7School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
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    References(21)

    [20] [20] JIANG J. Measuring method of grating structure parameters based on rigous coupled wave they[D]. Harbin: Harbin Institute of Technology, 2017. (in Chinese)

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    Yize WU, Dongbai XUE, Guangxu XIAO, Junyu SHEN, Xiao DENG, Ming KONG. Investigation of diffraction characteristics in stitched atomic lithography grating[J]. Infrared and Laser Engineering, 2025, 54(3): 20240502

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    Paper Information

    Category: 光电测量

    Received: Nov. 5, 2024

    Accepted: --

    Published Online: Apr. 8, 2025

    The Author Email: Dongbai XUE (xuedb@tongji.edu.cn)

    DOI:10.3788/IRLA20240502

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