Investigation of diffraction characteristics in stitched atomic lithography grating

Yize WU; Dongbai XUE; Guangxu XIAO; Junyu SHEN; Xiao DENG; Ming KONG

doi:10.3788/IRLA20240502

Infrared and Laser Engineering, Volume. 54, Issue 3, 20240502(2025)

Investigation of diffraction characteristics in stitched atomic lithography grating

Yize WU¹, Dongbai XUE^{2,3,4,5,6,7、*}, Guangxu XIAO^2,3,4,5,6,7, Junyu SHEN^2,3,4,5,6,7, Xiao DENG^2,3,4,5,6,7, and Ming KONG¹

Author Affiliations

¹College of Metrology & Measurement Instrumentation, China Jiliang University, Hangzhou 310018, China

²National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University, Shanghai 200092, China

³Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China

⁴MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai 200092, China

⁵Shanghai Frontiers Science Center of Digital Optics, Tongji University, Shanghai 200092, China

⁶Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University, Shanghai 200092, China

⁷School of Physics Science and Engineering, Tongji University, Shanghai 200092, China

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Figures & Tables(8)

$（a） Stitched optical images of the atomic lithography grating and AFM images of points P1-P7 in different regions of the grating; （b） Schematic diagram of the peak-to-valley height of the stitched grating; （c） Test optical path for the diffraction performance of the grating$

Fig. 1. （a） Stitched optical images of the atomic lithography grating and AFM images of points P₁-P₇ in different regions of the grating; （b） Schematic diagram of the peak-to-valley height of the stitched grating; （c） Test optical path for the diffraction performance of the grating

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$Schematic diagram of diffraction from the atomic lithography grating$

Fig. 2. Schematic diagram of diffraction from the atomic lithography grating

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Fig. 3. Simulation model of Gaussian gratings with different peak-to-valley heights

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$Simulation result curves of diffraction efficiency corresponding to different peak-to-valley heights$

Fig. 4. Simulation result curves of diffraction efficiency corresponding to different peak-to-valley heights

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$Testing device for the diffraction performance of the atomic lithography grating. (a) TM polarization incidence; (b) TE polarization incidence; (c) Design of incident and diffracted light detection (using TM polarization as an example)$

Fig. 5. Testing device for the diffraction performance of the atomic lithography grating. (a) TM polarization incidence; (b) TE polarization incidence; (c) Design of incident and diffracted light detection (using TM polarization as an example)

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$Comparison between experimental test data of diffraction energy utilization efficiency for stitched atomic lithography gratings and RCWA simulated diffraction efficiency curves. (a) TM polarization; (b) TE polarization$

Fig. 6. Comparison between experimental test data of diffraction energy utilization efficiency for stitched atomic lithography gratings and RCWA simulated diffraction efficiency curves. (a) TM polarization; (b) TE polarization

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Table 1. Simulation results of diffraction efficiency for gratings with different peak-to-valley heights.

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Table 1. Simulation results of diffraction efficiency for gratings with different peak-to-valley heights.

Grating peak-to-valley heigh/nm	Grating diffraction efficiency		Grating peak-to-valley height/nm	Grating diffraction efficiency
Grating peak-to-valley heigh/nm	TM polarization	TE polarization	Grating peak-to-valley height/nm	TM polarization	TE polarization
30	14.76%	0.3051%	60	32.25%	1.063%
35	18.02%	0.3978%	65	33.94%	1.219%
40	21.54%	0.5113%	70	35.24%	1.381%
45	24.78%	0.6356%	75	36.20%	1.547%
50	27.67%	0.7698%	80	36.84%	1.717%
55	30.17%	0.9125%	85	36.62%	1.915%

Table 2. Stitched results of the diffraction energy utilization efficiency test for the atomic lithography grating

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Table 2. Stitched results of the diffraction energy utilization efficiency test for the atomic lithography grating

Textgroup	Diffraction energy utilization efficiency		Text group	Diffraction energy utilization efficiency		Text group	Diffraction energy utilization efficiency
Textgroup	TM polarization	TE polarization	Text group	TM polarization	TE polarization	Text group	TM polarization	TE polarization
1	16.91%	0.5691%	12	17.59%	1.070%	23	18.26%	0.7317%
2	17.26%	0.5827%	13	17.88%	1.098%	24	18.10%	0.6775%
3	17.45%	0.6233%	14	17.97%	1.111%	25	17.86%	0.6504%
4	17.55%	0.6369%	15	17.97%	1.084%	26	17.41%	0.6098%
5	17.41%	0.6233%	16	17.98%	1.070%	27	16.97%	0.5691%
6	17.22%	0.5962%	17	17.98%	1.043%	28	16.41%	0.5149%
7	16.98%	0.5691%	18	18.09%	1.016%	29	15.74%	0.4607%
8	16.53%	0.5420%	19	18.14%	1.016%	30	14.83%	0.4065%
9	16.43%	0.5149%	20	18.24%	0.9891%	31	13.93%	0.3658%
10	16.60%	0.4878%	21	18.26%	0.9485%	32	13.26%	0.3252%
11	16.97%	0.5013%	22	18.29%	0.9079%

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Yize WU, Dongbai XUE, Guangxu XIAO, Junyu SHEN, Xiao DENG, Ming KONG. Investigation of diffraction characteristics in stitched atomic lithography grating[J]. Infrared and Laser Engineering, 2025, 54(3): 20240502

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Paper Information

Category: 光电测量

Received: Nov. 5, 2024

Accepted: --

Published Online: Apr. 8, 2025

The Author Email: Dongbai XUE (xuedb@tongji.edu.cn)

DOI:10.3788/IRLA20240502

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology