[1] Nichols M A. Summary of synthetic lap polishing experiments at LLNL. [C]∥3rd American Precision Optical Manufacturer's Association Optical Fabrication Workshop, November 5-6, 2001, Rochester. [S. l.]: [s. n.], 1-10(2001).

[2] Tang W L, Liang S J, Jiao X et al. Formation and control of scratches on surfaces of optical components during polishing[J]. Chinese Journal of Lasers, 46, 1202009(2019).

[3] Lai L W, Liu Z G, Jiao X et al. Suppression of mid-spatial-frequency errors in optical elements by polishing with compound swing multi-link mechanism[J]. Chinese Journal of Lasers, 46, 1102001(2019).

[4] Rambo P, Schwarz J, Kimmel M et al. Development of high damage threshold laser-machined apodizers and gain filters for laser applications[J]. High Power Laser Science and Engineering, 4, e32(2016).

[5] Wang S, Cheng J J, Chen Q. Properties of the phosphate glass scale inhibitor and its controlled-release mechanism[J]. Journal of Inorganic Materials, 15, 987-991(2000).

[6] Peedikakkandy L, Kalita L, Kavle P et al. Preparation of spherical ceria coated silica nanoparticle abrasives for CMP application[J]. Applied Surface Science, 357, 1306-1312(2015).

[7] Zhang Y, Xu Q L, Chen M et al. Experimental study of the influence of slurry particle size on material removal consequent in bowl-feed polishing[J]. Optical Technique, 40, 486-491(2014).

[8] Jones R A. Optimization of computer controlled polishing[J]. Applied Optics, 16, 218-224(1977).

[9] Schindler A, Hänsel T, Frost F et al. Ion beam finishing technology for high precision optics production. [C]∥Optical Fabrication and Testing, Tucson, Arizona. Washington, D.C.: OSA, 1-3(2002).

[10] Hedrick J B[J]. Sinha S P. Cerium-based polishing compounds: discovery to manufacture. Journal of Alloys, Compounds, 207/208, 377-382(1994).

[11] Liang S J, Tang W L, Jiao X et al. Effect of modified polishing agent on polishing quality of optical glass[J]. Chinese Journal of Lasers, 44, 1203001(2017).

[12] DeGroote J, Jacobs S D, Gregg L L et al. A data base for the physical properties of optical polishing pitch. [C]∥Optical Fabrication and Testing, Tucson, Arizona. Washington, D.C.: OSA, 55-59(2002).

[13] Xie Y S, Bhushan B. Effects of particle size, polishing pad and contact pressure in free abrasive polishing[J]. Wear, 200, 281-295(1996).

[14] Zhang B A, Zhu J Q, Fan Q T. Chemical-mechanical polishing of phosphate laser glass[J]. Chinese Journal of Lasers, 34, 1151-1154(2007).

[15] Asghar K, Qasim M, Nelabhotla D M et al. Effect of surfactant and electrolyte on surface modification of c-plane GaN substrate using chemical mechanical planarization (CMP) process[J]. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 497, 133-145(2016).