Chinese Journal of Lasers, Volume. 47, Issue 10, 1003001(2020)

Effect of Anionic Modified Polishing Agent on Nd-Doped Phosphate Laser Glass Polishing

Liu Boxun1,2,3, Jiao Xiang2,3, Tan Xiaohong2,3, and Zhu Jianqiang1,2,3、*
Author Affiliations
  • 1School of Physical Science and Technology, Shanghai Tech University, Shanghai 201210, China
  • 2National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3National Laboratory on High Power Laser and Physics, China Academy of Engineering Physics, Chinese Academy of Sciences, Shanghai 201800, China
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    Figures & Tables(6)
    Median particle diameter d50 of ceria abrasives in polishing slurry
    Effect of mass fraction of Lamepon A on material removal rate
    Effect of mass fraction of Lamepon A on surface roughness of Nd-glass
    Polishing quality of Nd-glass with different mass fraction of Lamepon A. (a) 0; (b) 0.20%; (c) 0.35%
    Effect of pH of polishing slurry on material removal rate
    Effect of pH of polishing slurry on surface roughness
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    Liu Boxun, Jiao Xiang, Tan Xiaohong, Zhu Jianqiang. Effect of Anionic Modified Polishing Agent on Nd-Doped Phosphate Laser Glass Polishing[J]. Chinese Journal of Lasers, 2020, 47(10): 1003001

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    Paper Information

    Category: materials and thin films

    Received: Apr. 3, 2020

    Accepted: --

    Published Online: Oct. 9, 2020

    The Author Email: Jianqiang Zhu (jqzhu@mail.shcnc.ac.cn)

    DOI:10.3788/CJL202047.1003001

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