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Laser Technology, Volume. 49, Issue 4, 532(2025)

Contrast analysis of the reflective holographic lithography system

Jiaqi ZHAO1,2,3、*, Fei HU2, Dengji GUO3, Xianpeng ZHANG2, and Xujin WANG1,3
Author Affiliations
  • 1College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China
  • 2Appotronics Corporation Ltd., Shenzhen 518054, China
  • 3Institute of Semiconductor Manufacturing Research, Shenzhen University, Shenzhen 518060, China
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    [19] [19] MAcLEOD A . Optical thin films[M]. London, UK: Institute of Physics Publishing, 2012.

    [20] [20] HEILMANN R K, KONKOLA P T, CHEN C G, et al. Digital heterodyne interference fringe control system[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2001, 19(6): 2342-2346.

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    Jiaqi ZHAO, Fei HU, Dengji GUO, Xianpeng ZHANG, Xujin WANG. Contrast analysis of the reflective holographic lithography system[J]. Laser Technology, 2025, 49(4): 532

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    Paper Information

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    Received: Jul. 8, 2024

    Accepted: --

    Published Online: Aug. 28, 2025

    The Author Email: Jiaqi ZHAO (zhaojiaqi@appotronics.com)

    DOI:10.7510/jgjs.issn.1001-3806.2025.04.009

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology