Laser Technology, Volume. 49, Issue 4, 532(2025)
Contrast analysis of the reflective holographic lithography system
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Table 1. [in Chinese]
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parameter value parameter value $ \lambda $ 405 nm $ n $ 1.6708 $ {d}_{\mathrm{p}} $ 400 nm $ \kappa $ 0.00847 $ {\theta }_{A} $ 30° $ {r}_{A} $ 0.3 $ {\theta }_{B} $ 30° $ {r}_{B} $ 0.3 $ {\phi }_{1} $ 90° $ \Delta\varphi_A $ π $ {\phi }_{2} $ 90° $ \Delta\varphi_B $ π
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Jiaqi ZHAO, Fei HU, Dengji GUO, Xianpeng ZHANG, Xujin WANG. Contrast analysis of the reflective holographic lithography system[J]. Laser Technology, 2025, 49(4): 532
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Received: Jul. 8, 2024
Accepted: --
Published Online: Aug. 28, 2025
The Author Email: Jiaqi ZHAO (zhaojiaqi@appotronics.com)
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