Chinese Journal of Lasers, Volume. 36, Issue 5, 1195(2009)

Influences of Oxygen Partial Pressure and Deposition Rate on Residual Stress of YSZ Thin Films

Xiao Qiling1,2、*, Shao Shuying1, Shao Jianda1, and Fan Zhengxiu1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    CLP Journals

    [1] Fang Ming, Shao Shuying, Shen Xuefeng, Fan Zhengxiu, Shao Jianda. Evolution of Growth Stress of HfO2 Thin Film[J]. Acta Optica Sinica, 2009, 29(6): 1734

    [2] Wu Jiang, Shen Weidong, Yuan Wenjia, Zhang Yueguang, Gu Peifu. Anti-Ultraviolet Radiation of Antireflection Coatings for Display Plastics[J]. Acta Optica Sinica, 2011, 31(2): 231001

    [3] Wang Zhi, Xu Xiangdong, Zhou Dong, Yang Zhuo, Jiang Yadong, Chen Chao. Study on Effect of Thermal Stress on Microbridges of Uncooled IRFPA and Controlling Methods[J]. Acta Optica Sinica, 2011, 31(3): 331002

    [4] Dong Wei, Zuo Ran, Lai Xiaohui, Shi Juncao. Simulation of Stresses inGaN Thin Film on Sapphire[J]. Laser & Optoelectronics Progress, 2013, 50(7): 73101

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    Xiao Qiling, Shao Shuying, Shao Jianda, Fan Zhengxiu. Influences of Oxygen Partial Pressure and Deposition Rate on Residual Stress of YSZ Thin Films[J]. Chinese Journal of Lasers, 2009, 36(5): 1195

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    Paper Information

    Category: materials and thin films

    Received: May. 13, 2008

    Accepted: --

    Published Online: May. 22, 2009

    The Author Email: Qiling Xiao (xql324@126.com)

    DOI:

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