Acta Physica Sinica, Volume. 69, Issue 7, 077302-1(2020)

The physics-based model of AlGaN/GaN high electron mobility transistor outer fringing capacitances

Nai-Zhang Liu, Xue-Bing Zhang, and Ruo-He Yao*
Author Affiliations
  • School of Electronics and Information Technology, South China University of Technology, Guangzhou 510640, China
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    Figures & Tables(12)
    Schematic of GaN HEMT outer fringing capacitances in different state: (a) In the OFF-state; (b) in the ON-state.
    Schematic of normal electric field between the side wall of the gate and the 2DEG.
    (a) Electric field lines after transforming the nonconfocal elliptical system to the confocal system; (b) the confocal system with Lcd = Ld.
    Error in the confocal system with Lcd = Ld.
    Cofd versus the extended depletion length induced by donor-like surface traps.
    The curve of the density ns of 2DEG and Ef versus Vg
    The curve of Vdsat versus Vg.
    The curve of Cofd versus Vds obtained from the traditional model and the model in this paper.
    The curve ofCofd versus Vth(The illustration show the curve of Vth with Al component and doped concentration).
    The curve of Cofd versus T
    The curve oftemperature sensitivity of Cofd under different drain bias.
    • Table 1. Model parameters in this paper.

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      Table 1. Model parameters in this paper.

      参数定义数值
      εx有效介电常数7.65ε0
      Esat/V·μm–1饱和电场15
      Ld/μm 漏端沟道长度1
      Tg/μm 栅极厚度0.3
      TAlGaN/nm AlGaN层厚度22
      $ E_{\rm g}^{\rm AIN} $/eV AIN禁带宽度6.13
      $ E_{\rm g}^{\rm GaN} $/eV GaN禁带宽度3.42
      VtempVth的依赖系数温度 0.1689
      TNOM/K 器件温标300
      ξ1拟合参数1.1
      ξ2拟合参数0.24
      m拟合参数1.2
      p拟合参数0.307
      τ拟合参数3.2
      a拟合参数1.497
      b拟合参数1.9
      c拟合参数0.31
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    Nai-Zhang Liu, Xue-Bing Zhang, Ruo-He Yao. The physics-based model of AlGaN/GaN high electron mobility transistor outer fringing capacitances[J]. Acta Physica Sinica, 2020, 69(7): 077302-1

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    Paper Information

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    Received: Dec. 20, 2019

    Accepted: --

    Published Online: Nov. 20, 2020

    The Author Email:

    DOI:10.7498/aps.69.20191931

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