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Chinese Journal of Lasers, Volume. 41, Issue 4, 416003(2014)

Optical Design of Lithography Projective Lens with Variable Total Track

Cai Yanmin*, Wang Xiangzhao, and Huang Huijie
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    [1] [1] Li Jinlong, Hu Song, Zhao Lixin. Control technique of wafer surface in dual-stage lithographic system[J]. Acta Optica Sinica, 2012, 32(12): 1223002.

    [2] [2] Lü Bo, Liu Weiqi, Kang Yusi, et al.. Design of all spherical surfaces zoom lithographic system[J]. Acta Optica Sinica, 2013, 33(6): 0622001.

    [4] [4] Zhu Jiangping, Hu Song, Yu Junsheng, et al.. A graphic matching method for digital micromirror device maskless photolithography[J]. Chinese J Lasers, 2012, 39(6): 0616002.

    [5] [5] Michael Quirk, Julian Serda. Semiconductor Manufacturing Technology[M]. Han Zhengsheng Transl. Beijing: Publishing House of Electronics Industry, 2009. 358-359.

    [6] [6] Zhang Yimo. Applied Optics (The second edition)[M]. Beijing: China Machine Press, 1988. 275-305.

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    Cai Yanmin, Wang Xiangzhao, Huang Huijie. Optical Design of Lithography Projective Lens with Variable Total Track[J]. Chinese Journal of Lasers, 2014, 41(4): 416003

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Oct. 8, 2013

    Accepted: --

    Published Online: Mar. 31, 2014

    The Author Email: Yanmin Cai (caiyanmin@163.com)

    DOI:10.3788/cjl201441.0416003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology