Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922017(2022)

Application of Laser Heterodyne Interference Technology in Lithography

Zhiping Zhang* and Xiaofeng Yang
Author Affiliations
  • Shanghai Engineering Research Center of Ultra-Precision Motion Control and Measurement, Academy for Engineering and Technology, Fudan University, Shanghai , 201203, China
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    References(21)

    [3] Zhang X, Liu H B, Gu W et al. A survey on the development of global lithography machines and the localization of lithography equipment[J]. Wireless Internet Technology, 15, 110-111, 118(2018).

    [4] Du H. Research on modeling and calibration method of high-precision grating displacement measurement system[D](2021).

    [8] Zheng Y Z, Dai F Z, Bu Y et al. Research on position measurement technology of lithography worktable based on plane grating ruler[C], 189(2016).

    [9] Xia Y. Grating interferometer simulation based on ZEMAX[D](2018).

    [16] Xing X, Chang D, Hu P C et al. Spatially separated heterodyne grating interferometer for in-plane displacement measurement[J]. Optics and Precision Engineering, 27, 1727-1736(2019).

    [17] Zhang P, Cui J J. Research progress in nonlinear error compensation suppression and measurement of heterodyne interferometer[J]. Laser & Optoelectronics Progress, 58, 1100003(2021).

    [20] Tan Y D, Xu X, Zhang S L. Precision measurement and applications of laser interferometry[J]. Chinese Journal of Lasers, 48, 1504001(2021).

    [25] Song L. Research on 6-degree-of-freedom measurement system of wafer stage[D](2013).

    [26] Chi F, Zhu Y, Zhang Z P et al. Environment compensation technologies in dual-frequency laser interferometer measurement system[J]. Chinese Journal of Lasers, 41, 0408004(2014).

    [27] Ding Z T. Research on environmental error of dual frequency laser interferometer measurement system[D](2021).

    [28] Yang G H, Wang Y, Li J et al. Influence of phase grating asymmetry on position measurement accuracy[J]. Acta Optica Sinica, 41, 1905001(2021).

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    Zhiping Zhang, Xiaofeng Yang. Application of Laser Heterodyne Interference Technology in Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922017

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Feb. 9, 2022

    Accepted: Mar. 14, 2022

    Published Online: May. 10, 2022

    The Author Email: Zhiping Zhang (zhangzp@fudan.edu.cn)

    DOI:10.3788/LOP202259.0922017

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