Application of Laser Heterodyne Interference Technology in Lithography

Zhiping Zhang; Xiaofeng Yang

doi:10.3788/LOP202259.0922017

Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922017(2022)

Application of Laser Heterodyne Interference Technology in Lithography

Zhiping Zhang^* and Xiaofeng Yang

Shanghai Engineering Research Center of Ultra-Precision Motion Control and Measurement, Academy for Engineering and Technology, Fudan University, Shanghai , 201203, China

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Zhiping Zhang, Xiaofeng Yang. Application of Laser Heterodyne Interference Technology in Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922017

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Paper Information

Category: Optical Design and Fabrication

Received: Feb. 9, 2022

Accepted: Mar. 14, 2022

Published Online: May. 10, 2022

The Author Email: Zhiping Zhang (zhangzp@fudan.edu.cn)

DOI:10.3788/LOP202259.0922017

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology