Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model

Mao Yanjie; Li Sikun; Wang Xiangzhao; Wei Yayi; Chen Guodong

doi:10.3788/AOS202040.0422002

Acta Optica Sinica, Volume. 40, Issue 4, 422002(2020)

Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model

Mao Yanjie^1,2, Li Sikun^1,2, Wang Xiangzhao^1,2, Wei Yayi³, and Chen Guodong^1,2

¹Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China

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Mao Yanjie, Li Sikun, Wang Xiangzhao, Wei Yayi, Chen Guodong. Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model[J]. Acta Optica Sinica, 2020, 40(4): 422002

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Paper Information

Category: Optical Design and Fabrication

Received: Sep. 16, 2019

Accepted: --

Published Online: Feb. 11, 2020

The Author Email:

DOI:10.3788/AOS202040.0422002

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