Chinese Optics Letters, Volume. 17, Issue 11, 113101(2019)
Effect of annealing on the damage threshold and optical properties of HfO2/Ta2O5/SiO2 high-reflection film
Figures & Tables(7)
Fig. 1. Transmission spectra of the HR films at different annealing temperatures.
Fig. 2. Influence of annealing temperature on refractive index of
Fig. 3. XRD spectra of
Fig. 4. Influence of annealing temperature on
Fig. 6. Damaged morphologies of HR films under the laser energy density of
Table 1. Ion Source Parameter during Deposition
View tableView in ArticleTable 1. Ion Source Parameter during Deposition
Material Anode Voltage (V) (sccm a Ar (sccm a 160 5 5.5 150 5 5 150 5 5
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Jianing Dong, Jie Fan, Sida Mao, Yunping Lan, Yonggang Zou, Haizhu Wang, Jiabin Zhang, Xiaohui Ma, "Effect of annealing on the damage threshold and optical properties of HfO2/Ta2O5/SiO2 high-reflection film," Chin. Opt. Lett. 17, 113101 (2019)
Paper Information
Category: Thin films
Received: May. 7, 2019
Accepted: Jul. 5, 2019
Published Online: Sep. 12, 2019
The Author Email: Jie Fan (fanjie@cust.edu.cn)
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