Effect of annealing on the damage threshold and optical properties of HfO2/Ta2O5/SiO2 high-reflection film

Jianing Dong; Jie Fan; Sida Mao; Yunping Lan; Yonggang Zou; Haizhu Wang; Jiabin Zhang; Xiaohui Ma

doi:10.3788/COL201917.113101

Chinese Optics Letters, Volume. 17, Issue 11, 113101(2019)

Effect of annealing on the damage threshold and optical properties of HfO₂/Ta₂O₅/SiO₂ high-reflection film

Jianing Dong, Jie Fan^*, Sida Mao, Yunping Lan, Yonggang Zou, Haizhu Wang, Jiabin Zhang, and Xiaohui Ma

State Key Laboratory of High-Power Semiconductor Laser, Changchun University of Science and Technology, Changchun 130022, China

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Jianing Dong, Jie Fan, Sida Mao, Yunping Lan, Yonggang Zou, Haizhu Wang, Jiabin Zhang, Xiaohui Ma, "Effect of annealing on the damage threshold and optical properties of HfO₂/Ta₂O₅/SiO₂ high-reflection film," Chin. Opt. Lett. 17, 113101 (2019)

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Paper Information

Category: Thin films

Received: May. 7, 2019

Accepted: Jul. 5, 2019

Published Online: Sep. 12, 2019

The Author Email: Jie Fan (fanjie@cust.edu.cn)

DOI:10.3788/COL201917.113101

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology