Chinese Journal of Lasers, Volume. 50, Issue 11, 1101019(2023)

Improved Performances of Lasers on Silicon (001) with Symmetrical Cathode Structures

Bojie Ma1, Jun Wang1、*, Hao Liu1, Chen Jiang1, Zhuoliang Liu1, Hao Zhai1, Jian Li2, Rui Ming1, Qing Ge1, Feng Lin1, Kai Liu1, Qi Wang1, Xin Wei2, Yongqing Huang1, and Xiaomin Ren1
Author Affiliations
  • 1State Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications, Beijing 100876, China
  • 2Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • show less
    Figures & Tables(7)
    Epitaxial structure and material characterization of the quantum dot laser. (a) Epitaxial structure; (b) scanning transmission electron microscopy (STEM) image; (c) photoluminescence (PL) spectrum of the quantum dots, where the inset is atomic force microscopy (AFM) image of the quantum dots measured within an area of 1 μm×1 μm
    Cross-sectional schematic of the laser and equivalent circuit. (a) Schematic of the conventional cathode structure; (b) equivalent circuit of the conventional cathode structure; (c) schematic of the symmetrical cathode structure; (d) equivalent circuit of the symmetrical cathode structure
    Structural schematic of the chip. (a)(b) Plan-view image of the chip with various scale bars; (c) plan-view SEM image of the chip; (d) cross-sectional SEM image of the chip; (e) three-dimensional structural schematic of the chip
    Characteristics of the quantum dot laser. (a) Light-current-voltage characteristics; (b) spectral characteristics
    Performance comparison of the lasers with different structures. (a) Current-voltage characteristics; (b) differential resistance; (c) lasing wavelength at different currents; (d) temperature characteristics
    Performance comparison of the lasers with different structures. (a) Wall-plug-efficiency (WPE); (b) slope efficiency and maximum single-side output power
    • Table 1. Chip size, n-contact layer thickness, differential resistance and doped concentration of each silicon-based laser

      View table

      Table 1. Chip size, n-contact layer thickness, differential resistance and doped concentration of each silicon-based laser

      YearChip size /(μm×μm)n-contact layer thickness /nmResistance /ΩDoped concentration /cm-3Ref.
      2017750×4419
      20171485×2.57003.421
      20173000×253002.96×101822
      20181079×2.57003.835
      20182000×155002.85×10189
      2019

      1450×10

      1450×2

      800

      2.7

      5

      2×101820
      20201270×55006.55×101823
      20212500×460014.525
      20222000×205007.24×101829
      2022

      1500×50

      2000×30

      500

      1.29

      1.52

      4×1018This work
    Tools

    Get Citation

    Copy Citation Text

    Bojie Ma, Jun Wang, Hao Liu, Chen Jiang, Zhuoliang Liu, Hao Zhai, Jian Li, Rui Ming, Qing Ge, Feng Lin, Kai Liu, Qi Wang, Xin Wei, Yongqing Huang, Xiaomin Ren. Improved Performances of Lasers on Silicon (001) with Symmetrical Cathode Structures[J]. Chinese Journal of Lasers, 2023, 50(11): 1101019

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: laser devices and laser physics

    Received: Sep. 27, 2022

    Accepted: Dec. 5, 2022

    Published Online: May. 19, 2023

    The Author Email: Wang Jun (wangjun12@bupt.edu.cn)

    DOI:10.3788/CJL221277

    Topics