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Chinese Journal of Liquid Crystals and Displays, Volume. 40, Issue 8, 1100(2025)

Review of low-temperature polycrystalline silicon oxide display driving technology and hydrogen diffusion behavior

Xi ZHANG1, Bin LIU1, Shuo ZHANG1, Congyang WEN1, Qi YAO1,2, Jian GUO2, Ce NING2, Guangcai YUAN2, Feng WANG1, and Zhinong YU1、*
Author Affiliations
  • 1Beijing Engineering Research Center of Mixed Reality and Advanced Display， School of Optics and Photonics， Beijing Institute of Technology， Beijing 100081， China
  • 2BOE Technology Group Co. Ltd.， Beijing 100176， China
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    Xi ZHANG, Bin LIU, Shuo ZHANG, Congyang WEN, Qi YAO, Jian GUO, Ce NING, Guangcai YUAN, Feng WANG, Zhinong YU. Review of low-temperature polycrystalline silicon oxide display driving technology and hydrogen diffusion behavior[J]. Chinese Journal of Liquid Crystals and Displays, 2025, 40(8): 1100

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    Received: Apr. 2, 2025

    Accepted: --

    Published Online: Sep. 25, 2025

    The Author Email: Zhinong YU (znyu@bit.edu.cn)

    DOI:10.37188/CJLCD.2025-0074

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