[1] [1] Xiao Yufei, Zhang Weiping, Huang Haihua, et al.. Influence of function of metal grating shape on surface plasmon resonance[J]. Chinese J Lasers, 2013, 40(11): 1114001.

[2] [2] Hu Jin, Pu Donglin, Wei Guojun, et al.. A method of dot- matrix holography based on the diffraction grating and spatial light modulator[J]. Chinese J Lasers, 2014, 41(6): 0609001.

[3] [3] Mindaugas Andruievicius. Methods and applications of optical holography[J]. Materials Science (Medziagotyra), 2011, 17(4): 371-375.

[4] [4] Ke Chunhe, Peng Zi′an, Chen Qilue, et al.. Advance in field emission display[J]. Vacuum Science And Technology, 1997, 17(2): 119-128.

[5] [5] Liu Yanbo, Min Guoquan, Song Zhitang, et al.. Si2Sb2Te5 based ultra- high- density PCRAM arrays fabricated by UV- IL[J]. Micronanoelectronic Technology, 2009, 46(1): 45-49.

[6] [6] Zhang Dongmei. Fabrication of 2D Photonic Crysta1 Templates by Holographic Lithography and Soft Lithography[D]. Hangzhou: Zhejiang University, 2007: 1-33.

[7] [7] Zhang Jin. Study on Laser Interferometric Lithography[D]. Chengdu: Sichuan University, 2003: 3-25, 109-115.

[8] [8] K J Klein Koerkamp, S Enoch, F B Segerink, et al.. Strong influence of hole shape on extraordinary transmission through periodic arrays of subwavelength holes[J]. Physical Review Letters, 2004, 92(18): 183901.

[9] [9] He Dechun, Han Zhenhai. Study on multi-beam interference[J]. Editorial Department of Hexi University, 2006, 22(2): 42-44.

[10] [10] J Y Suh, E U Donev, R Lopez, et al.. Modulated optical transmission of subwavalength hole arrays in metal-VO2 films[J]. Applied Physics Letters, 2006, 88(13): 133115.

[11] [11] Ren Lin. Study on Laser Interferometric Lithography Technology[D]. Jilin: Jinlin University, 2007: 23-57

[12] [12] Haofu Huang, Yuwei Jiang, Hung Hsin Chen, et al.. Localized shape resonance on silver film perforated by H-shaped and more complex shape hole arrays[J]. Optics Express, 2011, 19(6): 5225-5231.

[13] [13] Wang Yichong. Research on the Limiting Feature Sizes of Laser Interference Lithography[D]. Jilin: Changchun University of Science and Technology, 2013: 7-18.

[14] [14] Li Wenhao,Zhang Chengshan, Ba Yingexige, et al.. Study on precisely controlling the grating constant of holographic grating with Moire patter method[J]. Chinese J Scientific Instrument, 2013, 34(12): 2867-2873.

[15] [15] Liu Dandan, Wang Yong, Ye Zhen, et al.. Grating fabrication of 808 nm distributed feedback semiconductor laser by holographic photolithography[J]. Chinese J Lasers, 2015, 42(2): 0202008.

[16] [16] A R Clawson. Guide to references on III±V semiconductor chemical etching[J]. Materials Science and Engineering, 2000, 31(2001): 48-54.

[17] [17] Zhang Jian. Design, Growth and Fabrication of Near Infrared Semicomductor Laser Based on GaAs[D]. Jilin: University of Chinese Axademy of Sciences, 2013: 77-89.

[18] [18] Yang Jianyi, Wang Minghua, Jiang Xiaoqing, et al.. Selective etching of GaAs substrate[J]. Journal of Optoelectronics·Laser, 1998, 9(1): 51-53.