Chinese Journal of Lasers, Volume. 40, Issue 6, 616001(2013)

Design of Diffractive Optical Element for Pupil Shaping Optics in Projection Lithography System

Hu Zhonghua1,2、*, Yang Baoxi1,2, Zhu Jing1, Xiao Yanfen1, Zeng Aijun1,2, and Huang Huijie1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    CLP Journals

    [1] Jiang Haibo, Xing Tingwen. A Method of Source Optimization to Maximize Process Window[J]. Laser & Optoelectronics Progress, 2015, 52(10): 101101

    [2] Wang Jiazhou, Pang Hui, Zhang Man, Shi Lifang, Cao A′xiu, Deng Qiling. Design Method for Multi-Wavelength Diffractive Optical Element[J]. Acta Optica Sinica, 2015, 35(10): 1005002

    [3] Xing Shasha, Ran Yinghua, Jiang Haibo, Xing Tingwen. Illumination Mode Conversion System Design Based on Micromirror Array in Lithography[J]. Acta Optica Sinica, 2015, 35(11): 1111002

    [4] Cao Zhen, Li Yanqiu, Sun Yuanyuan. Compensator Selection and Accuracy Analysis for Extreme Ultraviolet Lithographic Objective[J]. Acta Optica Sinica, 2015, 35(12): 1211003

    [5] [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Design of Ultra-Short Throw Ratio Projection Lens[J]. Acta Optica Sinica, 2015, 35(12): 1222002

    [6] Yan Guanyong, Li Sikun, Wang Xiangzhao. Source Optimization Method of Lithography Tools Based on Quadratic Programming[J]. Acta Optica Sinica, 2014, 34(10): 1022004

    [7] Wang Jun, Wang Liping, Jin Chunshui, Miao Liang, Xie Yao. Extreme Ultraviolet Lithography Objective Design Based on Grouping and Graphical User Interface[J]. Acta Optica Sinica, 2015, 35(12): 1211001

    [8] Sun Yuanyuan, Li Yanqiu, Cao Zhen. Tolerance Analysis of High-Numerical Aperture Extreme Ultraviolet Lithographic Objective[J]. Laser & Optoelectronics Progress, 2015, 52(12): 122207

    [9] LI Meixuan, DONG Lianhe. Design and tolerance analysis of converging lens in immersion lithography illumination system[J]. Journal of Applied Optics, 2019, 40(5): 876

    [10] Song Qiang, Zhu Jing, Wang Jian, Zhang Fang, Lü Xiangbo, Yang Baoxi, Huang Huijie. A Mixed Gradient Algorithm for High Performance DOE Design in Off-Axis Lithography Illumination System[J]. Acta Optica Sinica, 2015, 35(1): 122005

    [11] Li Jianhui, Zheng Meng, Zhang Xuebing, Li Yanqiu. Study on Calibration and Error Compensation of Mueller Matrix Imaging Polarimeter[J]. Laser & Optoelectronics Progress, 2016, 53(2): 21202

    [12] Rui Dawei, Shi Zhenguang, Yuan Wenquan, Zhang Wei. Pupil Non-Balance Calibration for Lithographic Lens[J]. Chinese Journal of Lasers, 2014, 41(9): 916002

    [13] Gao Long, Xue Changxi, Yang Hongfang, Nie Xin. Effect of Decenter Errors on Diffraction Efficiency of Multilayer Diffractive Optical Elements in Long Infrared Waveband[J]. Acta Optica Sinica, 2015, 35(6): 623004

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    Hu Zhonghua, Yang Baoxi, Zhu Jing, Xiao Yanfen, Zeng Aijun, Huang Huijie. Design of Diffractive Optical Element for Pupil Shaping Optics in Projection Lithography System[J]. Chinese Journal of Lasers, 2013, 40(6): 616001

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jan. 7, 2013

    Accepted: --

    Published Online: May. 15, 2013

    The Author Email: Zhonghua Hu (huzhonghua@siom.ac.cn)

    DOI:10.3788/cjl201340.0616001

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