Acta Optica Sinica, Volume. 40, Issue 17, 1736001(2020)
Preparation of Subwavelength Nanostructures Based on Low-Energy Ion Bombardment
[1] Yang G Y, Hirsch D, Li J Y et al. Energy dependence of morphologies on photoresist surfaces under Ar + ion bombardment with normal incidence[J]. Applied Surface Science, 523, 146510(2020).
[2] Zhou J, Lu M. Mechanism of Fe impurity motivated ion-nanopatterning of Si (100) surfaces[J]. Physical Review B, 82, 125404(2010).
[3] Facsko S. Formation of ordered nanoscale semiconductor dots by ion sputtering[J]. Science, 285, 1551-1553(1999).
[4] Liao W L, Dai Y F, Nie X T et al. Nanostructure formation and regulation during low-energy ion beam sputtering of fused silica surfaces[J]. Optical Engineering, 56, 125102(2017).
[6] Bradley R M. Harper J M E. Theory of ripple topography induced by ion bombardment[J]. Journal of Vacuum Science & Technology A, 6, 2390-2395(1988).
[7] Carter G, Vishnyakov V[J]. Roughening and ripple instabilities on ion-bombarded Si Physical Review.
[9] Liu Y, Xu D Q, Xu X D et al. Reactive ion beam etching of large-aperture multilayer diffraction gratings by radio frequency ion beam source[J]. Proceedings of SPIE, 6724, 67240K(2007).
[10] Huang Q S, jia Q, Feng J T et al. Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy[J]. Nature Communications, 10, 2437(2019).
[12] Chen D K, Yang G Y, Li J Y et al. Terrace morphology on fused silica surfaces by Ar + ion bombardment with Mo co-deposition[J]. Applied Physics Letters, 113, 033102(2018).
[13] Ye X, Shao T, Sun L X et al. Plasma-induced, self-masking, one-step approach to an ultrabroadband antireflective and superhydrophilic subwavelength nanostructured fused silica surface[J]. ACS Applied Materials & Interfaces, 10, 13851-13859(2018).
[15] Yao Y, Shen Y, Hao J M et al. Antireflection coatings based on subwavelength artificial engineering microstructures[J]. Acta Physica Sinica, 68, 147802(2019).
[16] Chiappe D, Toma A, Zhang Z et al. Amplified nanopatterning by self-organized shadow mask ion lithography[J]. Applied Physics Letters, 97, 053102(2010).
Get Citation
Copy Citation Text
Gaoyuan Yang, Maoqi Cai, Jinyu Li, Huoyao Chen, Ying Liu, Yilin Hong. Preparation of Subwavelength Nanostructures Based on Low-Energy Ion Bombardment[J]. Acta Optica Sinica, 2020, 40(17): 1736001
Category: Letters
Received: May. 29, 2020
Accepted: Jul. 15, 2020
Published Online: Aug. 28, 2020
The Author Email: Liu Ying (liuychch@ustc.edu.cn)