Chinese Optics, Volume. 18, Issue 4, 931(2025)

785 nm semiconductor laser with shallow etched gratings

Yu-xin YUE, Yong-gang ZOU*, Jie FAN, Xi-yao FU, Nai-yu ZHANG, Ying-min SONG, Zhuo-er HUANG, and Xiao-hui MA*
Author Affiliations
  • State Key Laboratory of High-Power Semiconductor Lasers, Changchun University of Science and Technology, Changchun 130022, China
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    References(26)

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    [15] KAUL T, ERBERT G, MAAßDORF A et al. Extreme triple asymmetric (ETAS) epitaxial designs for increased efficiency at high powers in 9xx-nm diode lasers[J]. Proceedings of SPIE, 10514, 105140A(2018).

    [21] YANG J, ZHAO D G, LIU Z et al. Suppression the leakage of optical field and carriers in GaN-based laser diodes by using InGaN barrier layers[J]. IEEE Photonics Journal, 10, 1503107(2018).

    [24] YANG J CH, ZHAO D G, JIANG D SH et al. Enhancing the performance of GaN based LDs by using low In content InGaN instead of GaN as lower waveguide layer[J]. Optics & Laser Technology, 111, 810-813(2019).

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    Yu-xin YUE, Yong-gang ZOU, Jie FAN, Xi-yao FU, Nai-yu ZHANG, Ying-min SONG, Zhuo-er HUANG, Xiao-hui MA. 785 nm semiconductor laser with shallow etched gratings[J]. Chinese Optics, 2025, 18(4): 931

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    Paper Information

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    Received: Jun. 26, 2024

    Accepted: Aug. 22, 2024

    Published Online: Aug. 13, 2025

    The Author Email: Yong-gang ZOU (zouyg@cust.edu.cn), Xiao-hui MA (mxh@cust.edu.cn)

    DOI:10.37188/CO.EN-2024-0019

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