Critical Pattern Selection Method for Full-Chip Source and Mask Optimization Based on Depth-First Search

Xinhua Yang; Sikun Li; Lufeng Liao; Libin Zhang; Shuang Zhang; Shengrui Zhang; Weijie Shi; Yayi Wei; Xiangzhao Wang

doi:10.3788/AOS202242.1022002

Acta Optica Sinica, Volume. 42, Issue 10, 1022002(2022)

Critical Pattern Selection Method for Full-Chip Source and Mask Optimization Based on Depth-First Search

Xinhua Yang^1,2, Sikun Li^1,2、*, Lufeng Liao^1,2, Libin Zhang³, Shuang Zhang³, Shengrui Zhang⁴, Weijie Shi⁴, Yayi Wei³, and Xiangzhao Wang^1,2

Author Affiliations

¹Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China;

⁴DongFang JingYuan Electron Limited, Beijing 100176, China

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Xinhua Yang, Sikun Li, Lufeng Liao, Libin Zhang, Shuang Zhang, Shengrui Zhang, Weijie Shi, Yayi Wei, Xiangzhao Wang. Critical Pattern Selection Method for Full-Chip Source and Mask Optimization Based on Depth-First Search[J]. Acta Optica Sinica, 2022, 42(10): 1022002

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Paper Information

Category: Optical Design and Fabrication

Received: Nov. 17, 2021

Accepted: Dec. 13, 2021

Published Online: May. 10, 2022

The Author Email: Sikun Li (lisikun@siom.ac.com)

DOI:10.3788/AOS202242.1022002

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