Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Chinese Journal of Lasers, Volume. 39, Issue 8, 816002(2012)

Simulation and Experimental Research of 193 nm Projection Lithography Lens Supporting

Tian Wei*, Wang Ping, Wang Rudong, Wang Lipeng, and Sui Yongxin
Author Affiliations
  • [in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (11)
    Cited By (6)
    Tools
    Paper Information
    Topics
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    Tian Wei, Wang Ping, Wang Rudong, Wang Lipeng, Sui Yongxin. Simulation and Experimental Research of 193 nm Projection Lithography Lens Supporting[J]. Chinese Journal of Lasers, 2012, 39(8): 816002

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: Optical Design and Fabrication

    Received: Mar. 23, 2012

    Accepted: --

    Published Online: Jul. 9, 2012

    The Author Email: Wei Tian (tw_919@163.com)

    DOI:10.3788/cjl201239.0816002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology