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Chinese Journal of Lasers, Volume. 39, Issue 8, 816002(2012)

Simulation and Experimental Research of 193 nm Projection Lithography Lens Supporting

Tian Wei*, Wang Ping, Wang Rudong, Wang Lipeng, and Sui Yongxin
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    Article index updated: Mar. 11, 2025

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    Tian Wei, Wang Ping, Wang Rudong, Wang Lipeng, Sui Yongxin. Simulation and Experimental Research of 193 nm Projection Lithography Lens Supporting[J]. Chinese Journal of Lasers, 2012, 39(8): 816002

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Mar. 23, 2012

    Accepted: --

    Published Online: Jul. 9, 2012

    The Author Email: Wei Tian (tw_919@163.com)

    DOI:10.3788/cjl201239.0816002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology