Infrared and Laser Engineering, Volume. 51, Issue 7, 20210524(2022)

Design and tolerance analysis of the zoom system in 365 nmUV lithography illumination system

Peng Su
Author Affiliations
  • Luoyang Institute of Electro-Optical Equipment, Aviation Industry Corporation of China, Luoyang 471000, China
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    References(12)

    [1] [1] Zhao Yang. Design of complex illumination optical system f deep ultraviolet lithogrpahy[D]. Changchun: Changchun Institute of Optics, Fine Mechanics Physics, Chinese Academy of Sciences, 2010. (in Chinese)

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    [3] Zhang L, Liu D, Shi T, et al. Practical and accurate method for aspheric misalignment aberrations calibration in non-null interferometer testing[J]. Applied Optics, 52, 8501-8511(2013).

    [4] Zhang Wei, Gong Yan. Design of diffractive optical elements for off-axis illumination in projection lithography[J]. Opt Precision Eng, 16, 2081-2086(2008).

    [5] Song Qiang, Zhu Jing, Wang Jian. A mixed gradient algorithm for high performance DOE design in off axis lithography illumination system[J]. Acta Optica Sinica, 35, 0122005(2015).

    [6] Zhang Wei, Liang Chuanyang, Li Jin, . Design of opticelements for beam shaping and unigorm illumination in laser digital projection display system[J]. Acta Optica Sinica, 35, 0805001(2015).

    [7] Li Meixuan, Li Hong, Zhang Siqi, . Research on mirrors of beam stabilization system for immersion lithography[J]. Acta Photonica Sinica, 48, 0222003(2019).

    [8] Li Meixuan, Wang Li, Dong Lianhe, . Development of a novel optical variable attenuator in lithography exposure system[J]. Chinese Journal of Lasers, 45, 0103002(2018).

    [9] Li Meixuan, Wang Li, Dong Lianhe. Design of aspherical zoom optical system in immersion lithography lighting system[J]. Acta Photonica Sinica, 47, 0120002(2018).

    [10] Li Meixuan, Li Hong, Zhang Siqi, . Design of diffractive optical element based on discrete sampling encryption algorithm[J]. Infrared and Laser Engineering, 48, 0916004(2019).

    [11] Li Meixuan, Kan Xiaoting, Wang Meijiao. Design and analysis on a novel uniform compensator in lithography lighting system[J]. Laser & Infrared, 49, 105-109(2019).

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    Peng Su. Design and tolerance analysis of the zoom system in 365 nmUV lithography illumination system[J]. Infrared and Laser Engineering, 2022, 51(7): 20210524

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    Paper Information

    Category: Optical design

    Received: Jul. 30, 2021

    Accepted: --

    Published Online: Dec. 20, 2022

    The Author Email:

    DOI:10.3788/IRLA20210524

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