Infrared and Laser Engineering, Volume. 51, Issue 7, 20210524(2022)
Design and tolerance analysis of the zoom system in 365 nmUV lithography illumination system
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Fig. 2. Influence of the thickness error of the second surface on the focal length
Fig. 3. Influence of the thickness error of the 15th surface on the focal length
Fig. 4. Influence of the moving accuracy of moving part 1 on the focal length
Fig. 5. Influence of eccentricity error of lens 1 on the visual axis movement
Fig. 6. Influence of eccentricity error of lens 1 on telecentric degree
Fig. 7. Influence of eccentricity error of of lens 1 on the radius of 90% energy encircling circle
Fig. 8. Influence of the tilt error of lens 1 on the visual axis movement
Fig. 10. Influence of the tilt error of lens 1 on the radius of the 90% energy encircling circle
Fig. 11.
Table 1. Comparison table of design results and design requirements
View tableView in ArticleTable 1. Comparison table of design results and design requirements
Parameters Design requirements Design results Wavelength/nm 365 365 Entrance pupil diameter/mm 33 33 Field/(°) ±1.35 ±1.35 Image surface diameter/mm Φ30-120 Φ30-120 After working distance/mm ≥200 300 Image surface telecentric degrees/mrad ≤10 ≤5.1 Distortion ≤±2% ≤±0.6%
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Peng Su. Design and tolerance analysis of the zoom system in 365 nmUV lithography illumination system[J]. Infrared and Laser Engineering, 2022, 51(7): 20210524
Paper Information
Category: Optical design
Received: Jul. 30, 2021
Accepted: --
Published Online: Dec. 20, 2022
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