Influence of Spatial Coherence of Light Source on Uniformity of Deep Ultraviolet Lithography Illumination

Zijian Song; Shuang Gong; Yang Bu; Shuang Wei

doi:10.3788/AOS240695

Acta Optica Sinica, Volume. 44, Issue 13, 1326002(2024)

Influence of Spatial Coherence of Light Source on Uniformity of Deep Ultraviolet Lithography Illumination

Zijian Song^1,2, Shuang Gong^3、*, Yang Bu^2、**, and Shuang Wei^1,2

Author Affiliations

¹School of Microelectronics, Shanghai University, Shanghai 200444, China

²Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

³Zhangjiang Laboratory, Shanghai 201210, China

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Figures & Tables(16)

Fig. 1. Illumination modes and partial coherence factor^[4]. (a) Conventional illumination; (b) annular illumination; (c) dipole illumination; (d) quadrupole illumination

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Fig. 2. Structural diagram of beam shaping unit^[21]

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Fig. 3. Schematic of partially coherent illumination simplified model based on mutual intensity propagation theory

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Fig. 4. Illumination field and integral curve^[4]

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Fig. 5. Spatial coherence distribution of source

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Fig. 6. Influence of spatial coherence on illumination uniformity under different illumination modes. (a) Annular illumination; (b) dipole illumination; (c) quadrupole illumination

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Fig. 7. Influence of effective source point distribution on illumination uniformity. (a) Circular illumination with two types of internal coherence factors; (b) line chart of change in illumination uniformity

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Fig. 8. Influence of number of coherent cells on illumination field speckle effect

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Fig. 9. Influence of speckle effect on illumination field of view

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Fig. 10. Speckle patterns under different illumination pupil modes. (a)(d) Annular illumination and its speckle pattern; (b)(e) quadrupole illumination and its speckle pattern; (c)(f) dipole illumination and its speckle pattern

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Fig. 11. Influence of speckle effects on uniformity and speckle contrast of mask plane field. (a) Annular illumination σ=[0.20, 0.88]; (b) annular illumination σ=[0.64,0.88]; (c) dipole illumination σ=[0.20, 0.88]; (d) quadrupole illumination σ=[0.20, 0.88]

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Table 1. Simulation parameters of illumination system
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Table 1. Simulation parameters of illumination system
Simulation parameter Numerical value
Wavelength λ /nm 193
NA 0.93
Magnification ratio -1/4
Length of object field along X /mm 104
Length of object field along Y /mm 22

Table 2. Design specification of MMA^[21]
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Table 2. Design specification of MMA^[21]
Simulation parameter Numerical value
Number 71×71
Size along X /mm 0.500
Size along Y /mm 0.707

Table 3. Design specification of other elements^[21]
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Table 3. Design specification of other elements^[21]
Simulation parameter Numerical value
Focus of microlens /mm 164.7
Focus of relay len /mm 1000
Diameter of pupil plane /mm 150

Table 4. Illumination mode simulation parameters^[4]
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Table 4. Illumination mode simulation parameters^[4]
Group Annular Dipole Quadrupole
$σ_{i n}$ $σ_{o u t}$ $σ_{i n}$ $σ_{o u t}$ $σ_{i n}$ $σ_{o u t}$
1 0.64 0.88 0.64 0.88 0.64 0.88
2 0.20 0.88 0.20 0.88 0.20 0.88
3 0.20 0.44 0.20 0.44 0.20 0.44

Table 5. Maximum spatial coherence to meet lighting requirements
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Table 5. Maximum spatial coherence to meet lighting requirements
Illumination mode Maximum spatial coherence/%
σ=[0.64,
0.88]
σ=[0.20, 0.88] σ=[0.20, 0.44]
Annular 4.83 6.46 3.37
Dipole 4.40 5.03 2.96
Quadrupole 4.02 5.02 3.11

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Zijian Song, Shuang Gong, Yang Bu, Shuang Wei. Influence of Spatial Coherence of Light Source on Uniformity of Deep Ultraviolet Lithography Illumination[J]. Acta Optica Sinica, 2024, 44(13): 1326002

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