Acta Optica Sinica, Volume. 44, Issue 13, 1326002(2024)
Influence of Spatial Coherence of Light Source on Uniformity of Deep Ultraviolet Lithography Illumination
Article index updated: Sep. 6, 2025
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Zijian Song, Shuang Gong, Yang Bu, Shuang Wei. Influence of Spatial Coherence of Light Source on Uniformity of Deep Ultraviolet Lithography Illumination[J]. Acta Optica Sinica, 2024, 44(13): 1326002
Category: Physical Optics
Received: Mar. 5, 2024
Accepted: Mar. 21, 2024
Published Online: Jul. 17, 2024
The Author Email: Shuang Gong (gongshuang@zjlab.ac.an), Yang Bu (buyang@siom.ac.cn)
CSTR:32393.14.AOS240695