Influence of Spatial Coherence of Light Source on Uniformity of Deep Ultraviolet Lithography Illumination

Zijian Song; Shuang Gong; Yang Bu; Shuang Wei

doi:10.3788/AOS240695

Acta Optica Sinica, Volume. 44, Issue 13, 1326002(2024)

Influence of Spatial Coherence of Light Source on Uniformity of Deep Ultraviolet Lithography Illumination

Zijian Song^1,2, Shuang Gong^3、*, Yang Bu^2、**, and Shuang Wei^1,2

Author Affiliations

¹School of Microelectronics, Shanghai University, Shanghai 200444, China

²Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

³Zhangjiang Laboratory, Shanghai 201210, China

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Zijian Song, Shuang Gong, Yang Bu, Shuang Wei. Influence of Spatial Coherence of Light Source on Uniformity of Deep Ultraviolet Lithography Illumination[J]. Acta Optica Sinica, 2024, 44(13): 1326002

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Paper Information

Category: Physical Optics

Received: Mar. 5, 2024

Accepted: Mar. 21, 2024

Published Online: Jul. 17, 2024

The Author Email: Shuang Gong (gongshuang@zjlab.ac.an), Yang Bu (buyang@siom.ac.cn)

DOI:10.3788/AOS240695

CSTR:32393.14.AOS240695

Topics

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Lasers and Laser Optics

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