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Journal of Synthetic Crystals, Volume. 50, Issue 3, 509(2021)

Effect of Deposition Temperature on Microstructure of Silicon Oxide Film Prepared by Plasma Enhanced Chemical Vapor Deposition

YOU Jiachuan1,2、*, ZHAO Lei1,2,3, DIAO Hongwei1, and WANG Wenjing1,2,3
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    YOU Jiachuan, ZHAO Lei, DIAO Hongwei, WANG Wenjing. Effect of Deposition Temperature on Microstructure of Silicon Oxide Film Prepared by Plasma Enhanced Chemical Vapor Deposition[J]. Journal of Synthetic Crystals, 2021, 50(3): 509

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    Paper Information

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    Received: Jan. 24, 2021

    Accepted: --

    Published Online: Apr. 15, 2021

    The Author Email: Jiachuan YOU (yjccxs@163.com)

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology