High-throughput fabrication of large-scale metasurfaces using electron-beam lithography with SU-8 gratings for multilevel security printing

You Sin Tan; Hao Wang; Hongtao Wang; Chengfeng Pan; Joel K. W. Yang

doi:10.1364/PRJ.472212

Photonics Research, Volume. 11, Issue 3, B103(2023)

High-throughput fabrication of large-scale metasurfaces using electron-beam lithography with SU-8 gratings for multilevel security printing Spotlight on Optics

You Sin Tan¹, Hao Wang^1,3、*, Hongtao Wang¹, Chengfeng Pan¹, and Joel K. W. Yang^1,2,4、*

Author Affiliations

¹Singapore University of Technology and Design, 487372 Singapore, Singapore

²Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 138634 Singapore, Singapore

³e-mail: hao_wang@sutd.edu.sg

⁴e-mail: joel_yang@sutd.edu.sg

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References(70)

[1] C. Jung, G. Kim, M. Jeong, J. Jang, Z. Dong, T. Badloe, J. K. W. Yang, J. Rho. Metasurface-driven optically variable devices. Chem. Rev., 121, 13013-13050(2021).

[2] G. Yoon, T. Tanaka, T. Zentgraf, J. Rho. Recent progress on metasurfaces: applications and fabrication. J. Phys. D, 54, 383002(2021).

[3] S. Shrestha, A. C. Overvig, M. Lu, A. Stein, N. Yu. Broadband achromatic dielectric metalenses. Light Sci. Appl., 7, 85(2018).

[4] M. Khorasaninejad, A. Y. Zhu, C. Roques-Carmes, W. T. Chen, J. Oh, I. Mishra, R. C. Devlin, F. Capasso. Polarization-insensitive metalenses at visible wavelengths. Nano Lett., 16, 7229-7234(2016).

[5] M. Khorasaninejad, F. Capasso. Metalenses: versatile multifunctional photonic components. Science, 358, eaam8100(2017).

[6] F. Aieta, P. Genevet, M. A. Kats, N. Yu, R. Blanchard, Z. Gaburro, F. Capasso. Aberration-free ultrathin flat lenses and axicons at telecom wavelengths based on plasmonic metasurfaces. Nano Lett., 12, 4932-4936(2012).

[7] M. Khorasaninejad, W. T. Chen, R. C. Devlin, J. Oh, A. Y. Zhu, F. Capasso. Metalenses at visible wavelengths: diffraction-limited focusing and subwavelength resolution imaging. Science, 352, 1190-1194(2016).

[8] K. T. P. Lim, H. Liu, Y. Liu, J. K. W. Yang. Holographic colour prints for enhanced optical security by combined phase and amplitude control. Nat. Commun., 10, 25(2019).

[9] L. Duempelmann, A. Luu-Dinh, B. Gallinet, L. Novotny. Four-fold color filter based on plasmonic phase retarder. ACS Photon., 3, 190-196(2016).

[10] Y. Horie, S. Han, J.-Y. Lee, J. Kim, Y. Kim, A. Arbabi, C. Shin, L. Shi, E. Arbabi, S. M. Kamali, H.-S. Lee, S. Hwang, A. Faraon. Visible wavelength color filters using dielectric subwavelength gratings for backside-illuminated cmos image sensor technologies. Nano Lett., 17, 3159-3164(2017).

[11] M. Nawrot, Ł. Zinkiewicz, B. Włodarczyk, P. Wasylczyk. Transmission phase gratings fabricated with direct laser writing as color filters in the visible. Opt. Express, 21, 31919-31924(2013).

[12] S. Wu, Y. Ye, H. Duan, Y. Gu, L. Chen. Large-area, optical variable-color metasurfaces based on pixelated plasmonic nanogratings. Adv. Opt. Mater., 7, 1801302(2019).

[13] C. Jung, S. J. Kim, J. Jang, J. H. Ko, D. Kim, B. Ko, Y. M. Song, S. H. Hong, J. Rho. Disordered-nanoparticle-based Etalon for ultrafast humidity-responsive colorimetric sensors and anti-counterfeiting displays. Sci. Adv., 8, eabm8598(2022).

[14] T. Badloe, J. Kim, I. Kim, W. S. Kim, W. S. Kim, Y. K. Kim, J. Rho. Liquid crystal-powered Mie resonators for electrically tunable photorealistic color gradients and dark blacks. Light Sci. Appl., 11, 118(2022).

[15] H. Sroor, Y.-W. Huang, B. Sephton, D. Naidoo, A. Vallés, V. Ginis, C.-W. Qiu, A. Ambrosio, F. Capasso, A. Forbes. High-purity orbital angular momentum states from a visible metasurface laser. Nat. Photonics, 14, 498-503(2020).

[16] N. Yu, F. Capasso. Flat optics with designer metasurfaces. Nat. Mater., 13, 139-150(2014).

[17] N. Yu, P. Genevet, M. A. Kats, F. Aieta, J.-P. Tetienne, F. Capasso, Z. Gaburro. light propagation with phase discontinuities: generalized laws of reflection and refraction. Science, 334, 333-337(2011).

[18] H. Wang, Y. Liu, Q. Ruan, H. Liu, R. J. H. Ng, Y. S. Tan, H. Wang, Y. Li, C. Qiu, J. K. W. Yang. Off-axis holography with uniform illumination via 3D printed diffractive optical elements. Adv. Opt. Mater., 7, 1900068(2019).

[19] H. Ren, X. Fang, J. Jang, J. Bürger, J. Rho, S. A. Maier. Complex-amplitude metasurface-based orbital angular momentum holography in momentum space. Nat. Nanotechnol., 15, 948-955(2020).

[20] H. Ren, G. Briere, X. Fang, P. Ni, R. Sawant, S. Héron, S. Chenot, S. Vézian, B. Damilano, V. Brändli, S. A. Maier, P. Genevet. Metasurface orbital angular momentum holography. Nat. Commun., 10, 2986(2019).

[21] J. Kim, D. Jeon, J. Seong, T. Badloe, N. Jeon, G. Kim, J. Kim, S. Baek, J. L. Lee, J. Rho. Photonic encryption platform via dual-band vectorial metaholograms in the ultraviolet and visible. ACS Nano, 16, 3546-3553(2022).

[22] D. N. Hutchison, J. Sun, J. K. Doylend, R. Kumar, J. Heck, W. Kim, C. T. Phare, A. Feshali, H. Rong. High-resolution aliasing-free optical beam steering. Optica, 3, 887-890(2016).

[23] Z. Wei, Y. Cao, X. Su, Z. Gong, Y. Long, H. Li. Highly efficient beam steering with a transparent metasurface. Opt. Express, 21, 10739-10745(2013).

[24] A. Nadzeyka, S. Bauerdick, M. Kahl, H. Duan, Y. Chen, K. Bi. FIB-based sketch & peel for fast and precise patterning of large-scale nanostructures. Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), 4(2018).

[25] Y. Chen, Z. Shu, S. Zhang, P. Zeng, H. Liang, M. Zheng, H. Duan. Sub-10 nm fabrication: methods and applications. Int. J. Extrem. Manuf., 3, 032002(2021).

[26] Y. Chen, K. Bi, Q. Wang, M. Zheng, Q. Liu, Y. Han, J. Yang, S. Chang, G. Zhang, H. Duan. Rapid focused ion beam milling based fabrication of plasmonic nanoparticles and assemblies via ‘sketch and peel’ strategy. ACS Nano, 10, 11228-11236(2016).

[27] Q. Liu, Y. Chen, Z. Feng, Z. Shu, H. Duan. Resist nanokirigami for multipurpose patterning. Natl. Sci. Rev., nwab231(2021).

[28] M. Altissimo. Electron-beam lithography for micro-/nanofabrication. Biomicrofluidics, 4, 026503(2010).

[29] S. Okazaki. High resolution optical lithography or high throughput electron beam lithography: the technical struggle from the micro to the nano-fabrication evolution. Microelectron. Eng., 133, 23-35(2015).

[30] Y. Chen. Nanofabrication by electron beam lithography and its applications: a review. Microelectron. Eng., 135, 57-72(2015).

[31] J. T. Fourkas. Nanoscale photolithography with visible light. J. Phys. Chem. Lett., 1, 1221-1227(2010).

[32] C. Williams, G. S. D. Gordon, T. D. Wilkinson, S. E. Bohndiek. Grayscale-to-color: scalable fabrication of custom multispectral filter arrays. ACS Photon., 6, 3132-3141(2019).

[33] N. Li, Y. H. Fu, Y. Dong, T. Hu, Z. Xu, Q. Zhong, D. Li, K. H. Lai, S. Zhu, Q. Lin, Y. Gu, N. Singh. Large-area pixelated metasurface beam deflector on a 12-inch glass wafer for random point generation. Nanophotonics, 8, 1855-1861(2019).

[34] N. Li, Z. Xu, Y. Dong, T. Hu, Q. Zhong, Y. H. Fu, S. Zhu, N. Singh. Large-area metasurface on CMOS-compatible fabrication platform: driving flat optics from lab to fab. Nanophotonics, 9, 3071-3087(2020).

[35] S. Y. Chou. Nanoimprint lithography. J. Vac. Sci. Technol. B, 14, 4129-4133(1996).

[36] J. Kim, J. Seong, W. Kim, G. Y. Lee, H. Kim, S. W. Moon, J. Jang, Y. Kim, Y. Yang, D. K. Oh, C. Park, H. Choi, H. Jeon, K. Lee, B. Lee, H. Lee, J. Rho. Scalably manufactured high-index atomic layer-polymer hybrid metasurfaces for high-efficiency virtual reality metaoptics in the visible(2022).

[37] G. Yoon, K. Kim, D. Huh, H. Lee, J. Rho. Single-step manufacturing of hierarchical dielectric metalens in the visible. Nat. Commun., 11, 2268(2022).

[38] Z. Liu, Q. Cui, Z. Huang, L. J. Guo. Transparent colored display enabled by flat glass waveguide and nanoimprinted multilayer gratings. ACS Photon., 7, 1418-1424(2020).

[39] S. H. Ahn, L. J. Guo. Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting. ACS Nano, 3, 2304-2310(2009).

[40] A. Boltasseva. Plasmonic components fabrication via nanoimprint. J. Opt. A, 11, 114001(2009).

[41] R. Ikeno, S. Maruyama, Y. Mita, M. Ikeda, K. Asada. Electron-beam lithography with character projection technique for high-throughput exposure with line-edge quality control. J. Micro/Nanolithogr. MEMS MOEMS, 15, 031606(2016).

[42] H. Sailer, A. Ruderisch, W. Henschel, V. Schurig, D. P. Kern. High resolution electron beam lithography using a chemically amplified calix[4]arene based resist. J. Vac. Sci. Technol. B, 22, 3485(2004).

[43] B. Bilenberg, S. Jacobsen, M. S. Schmidt, L. H. D. Skjolding, P. Shi, P. Bøggild, J. O. Tegenfeldt, A. Kristensen. High resolution 100 kV electron beam lithography in SU-8. Microelectron. Eng., 83, 1609-1612(2006).

[44] B. Bilenberg, P. Shi, M. S. Schmidt, P. Bøggild, M. Fink, C. Schuster, F. Reuther, C. Gruetzner, A. Kristensen. Comparison of high resolution negative electron beam resists. J. Vac. Sci. Technol. B, 24, 1776(2006).

[45] H. Lorenz, M. Despont, N. Fahrni, N. LaBianca, P. Renaud, P. Vettiger. SU-8: a low-cost negative resist for MEMS. J. Micromech. Microeng., 7, 121-124(1997).

[46] L. Jiang, K.-J. Kim, F. M. Reininger, S. Jiguet, S. Pau. Microfabrication of a color filter array utilizing colored SU-8 photoresists. Appl. Opt., 59, G137-G145(2020).

[47] M. Aktary, M. O. Jensen, K. L. Westra, M. J. Brett, M. R. Freeman. High-resolution pattern generation using the epoxy Novolak SU-8 2000 resist by electron beam lithography. J. Vac. Sci. Technol. B, 21, L5(2003).

[48] H. Namatsu. Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations. J. Vac. Sci. Technol. B, 16, 69-76(1998).

[49] J. K. W. Yang, K. K. Berggren. Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography. J. Vac. Sci. Technol. B, 25, 2025-2029(2007).

[50] J. M. Shaw, J. D. Gelorme, N. C. LaBianca, W. E. Conley, S. J. Holmes. Negative photoresists for optical lithography. IBM J. Res. Dev., 41, 81-94(1997).

[51] D. M. Koller, A. Hohenau, H. Ditlbacher, N. Galler, A.-L. Baudrion, F. Reil, S. Schausberger, F. R. Aussenegg, A. Leitner, J. R. Krenn. Three-dimensional SU-8 sub-micrometer structuring by electron beam lithography. Microelectron. Eng., 85, 1639-1641(2008).

[52] C. J. Chang-Hasnain, W. Yang. High-contrast gratings for integrated optoelectronics. Adv. Opt. Photon., 4, 379-440(2012).

[53] A. V. Tishchenko. Phenomenological representation of deep and high contrast lamellar gratings by means of the modal method. Opt. Quantum Electron., 37, 309-330(2005).

[54] H. Wang, Q. Ruan, H. Wang, S. D. Rezaei, K. T. P. Lim, H. Liu, W. Zhang, J. Trisno, J. Y. E. Chan, J. K. W. Yang. Full color and grayscale painting with 3D printed low-index nanopillars. Nano Lett., 21, 4721-4729(2021).

[55] H. K. Raut, H. Wang, Q. Ruan, H. Wang, J. G. Fernandez, J. K. W. Yang. Hierarchical colorful structures by three-dimensional printing of inverse opals. Nano Lett., 21, 8602-8608(2021).

[56] Q. Ruan, W. Zhang, H. Wang, J. Y. E. Chan, H. Wang, H. Liu, D. Fan, C. Qiu, J. K. W. Yang. Reconfiguring colors of single relief structures by directional stretching. Adv. Mater., 34, 2108128(2021).

[57] Y. Liu, H. Wang, J. Ho, R. C. Ng, R. J. H. Ng, V. H. Hall-Chen, E. H. H. Koay, Z. Dong, H. Liu, C.-W. Qiu, J. R. Greer, J. K. W. Yang. Structural color three-dimensional printing by shrinking photonic crystals. Nat. Commun., 10, 4340(2019).

[58] R. J. H. Ng, R. V. Krishnan, H. Wang, J. K. W. Yang. Darkfield colors from multi-periodic arrays of gap plasmon resonators. Nanophotonics, 9, 533-545(2020).

[59] J. Olson, A. Manjavacas, L. Liu, W.-S. Chang, B. Foerster, N. S. King, M. W. Knight, P. Nordlander, N. J. Halas, S. Link. Vivid, full-color aluminum plasmonic pixels. Proc. Natl. Acad. Sci. USA, 111, 14348-14353(2014).

[60] T. Clausnitzer, T. Kämpfe, E.-B. Kley, A. Tünnermann, U. Peschel, A. V. Tishchenko, O. Parriaux. An intelligible explanation of highly-efficient diffraction in deep dielectric rectangular transmission gratings. Opt. Express, 13, 10448-10456(2005).

[61] T. K. Gaylord, M. G. Moharam. Analysis and applications of optical diffraction by gratings. Proc. IEEE, 73, 894-937(1985).

[62] I. C. Botten, M. S. Craig, R. C. McPhedran, J. L. Adams, J. R. Andrewartha. The dielectric Lamellar diffraction grating. Opt. Acta, 28, 413-428(1981).

[63] M. Yasui, E. Kazawa, S. Kaneko, R. Takahashi, M. Kurouchi, T. Ozawa, M. Arai. Effects of post exposure bake temperature and exposure time on SU-8 nanopattern obtained by electron beam lithography. Jpn. J. Appl. Phys., 53, 11RF03(2014).

[64] N. Glezos, P. Argitis, D. Velessiotis, I. Raptis, M. Hatzakis, P. Hudek, I. Kostic. Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography. J. Vac. Sci. Technol. B, 18, 3431(2000).

[65] R. Halir, A. Ortega-Monux, D. Benedikovic, G. Z. Mashanovich, J. G. Wangüemert-Pérez, J. H. Schmid, I. Molina-Fernandez, P. Cheben. Subwavelength-grating metamaterial structures for silicon photonic devices. Proc. IEEE, 106, 2144-2157(2018).

[66] K. O. Hill, G. Meltz. Fiber Bragg grating technology fundamentals and overview. J. Lightwave Technol., 15, 1263-1276(1997).

[67] P. Cheben, R. Halir, J. H. Schmid, H. A. Atwater, D. R. Smith. Subwavelength integrated photonics. Nature, 560, 565-572(2018).

[68] R. Halir, P. J. Bock, P. Cheben, A. Ortega-Moñux, C. Alonso-Ramos, J. H. Schmid, J. Lapointe, D.-X. Xu, J. G. Wangüemert-Pérez, Í. Molina-Fernández. Waveguide sub-wavelength structures: a review of principles and applications. Laser Photon. Rev., 9, 25-49(2015).

[69] N. W. Parker, A. D. Brodie, J. H. McCoy. High-throughput NGL electron-beam direct-write lithography system. Proc. SPIE, 3997, 713-720(2000).

[70] A. Pepin. Exploring the high sensitivity of SU-8 resist for high resolution electron beam patterning. Microelectron. Eng., 73, 233-237(2004).

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You Sin Tan, Hao Wang, Hongtao Wang, Chengfeng Pan, Joel K. W. Yang, "High-throughput fabrication of large-scale metasurfaces using electron-beam lithography with SU-8 gratings for multilevel security printing," Photonics Res. 11, B103 (2023)

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Paper Information

Special Issue: OPTICAL METASURFACES: FUNDAMENTALS AND APPLICATIONS

Received: Aug. 8, 2022

Accepted: Nov. 9, 2022

Published Online: Feb. 24, 2023

The Author Email: Hao Wang (hao_wang@sutd.edu.sg), Joel K. W. Yang (joel_yang@sutd.edu.sg)

DOI:10.1364/PRJ.472212

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology