Photonics Research, Volume. 11, Issue 3, B103(2023)
High-throughput fabrication of large-scale metasurfaces using electron-beam lithography with SU-8 gratings for multilevel security printing Spotlight on Optics
Fig. 1. Schematic of the proposed SU-8 grating structures for multilevel optical security print based on different light illumination conditions, namely bright-field reflection, dark-field reflection, and cross-polarized reflection.
Fig. 2. Bright-field and dark-field colors. (a) Bright-field and (b) dark-field reflection micrographs for gratings with gap varying from 500 to 800 nm and width varying from 150 to 750 nm. (c) Bright-field and (d) dark-field reflection micrographs for gratings with period varying from 800 to 2000 nm and grating width fixed at 300 nm. The dose factor is varying from 1 to 3.5 with base dose of
Fig. 3. Cross-polarized reflection. SEM images of the grating orientations of (a) 0° and (b) 45°. (c), (d) and (e), (f) Corresponding optical micrographs under dark-field illumination and cross-polarized reflection. (g) and (h) Schematics of polarization change upon reflection from different grating orientations.
Fig. 4. Multilevel security print. (a) Bright-field micrograph of grayscale image caused by different density of structures. Dark-field micrographs (top) of the image with bright and vivid colors and part of the corresponding SEM images (bottom) with (b) non-randomization and (c) randomization of grating orientations. (d) Bright-field micrograph of cross-polarized reflection of the image with the hidden information encrypted by the orientations of the gratings. (e) Bright-field micrograph of grayscale image caused by different density of structures. The “SUTD” word was exposed with dose of
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You Sin Tan, Hao Wang, Hongtao Wang, Chengfeng Pan, Joel K. W. Yang, "High-throughput fabrication of large-scale metasurfaces using electron-beam lithography with SU-8 gratings for multilevel security printing," Photonics Res. 11, B103 (2023)
Special Issue: OPTICAL METASURFACES: FUNDAMENTALS AND APPLICATIONS
Received: Aug. 8, 2022
Accepted: Nov. 9, 2022
Published Online: Feb. 24, 2023
The Author Email: Hao Wang (hao_wang@sutd.edu.sg), Joel K. W. Yang (joel_yang@sutd.edu.sg)