[1] Shi X Z, Chen C S, Liu S H et al. Nonvolatile and reconfigurable tuning of surface lattice resonances using phase-change Ge2Sb2Te5 thin films[J]. Results in Physics, 22, 103897(2021).

[2] Liu B, Wei T, Hu J et al. Universal memory based on phase-change materials: from phase-change random access memory to optoelectronic hybrid storage[J]. Chinese Physics B, 30, 058504(2021).

[3] Du L L, Zhou X Y, Li X. Review of phase change memory and its application in neuromorphic computation[J]. Journal of Synthetic Crystals, 49, 2398-2405(2020).

[4] Sheng J J. Testing methods for electrical properties of phase change random access memory cell[D](2009).

[5] Antolini A, Scarselli E F, Gnudi A et al. Characterization and programming algorithm of phase change memory cells for analog in-memory computing[J]. Materials, 14, 1624(2021).

[6] Liang J L, Jeyasingh R G D, Chen H Y et al. An ultra-low reset current cross-point phase change memory with carbon nanotube electrodes[J]. IEEE Transactions on Electron Devices, 59, 1155-1163(2012).

[7] Lan T. Device structure and fabrication process of phase change memory[D](2017).

[8] Li W, Chen S Q, Deng H. Potential application of far-field superlens in optical critical dimension metrology: a simulation study[J]. Optical Engineering, 56, 053109(2017).

[9] Mei Q, Gao J, Lin H et al. Structure light telecentric stereoscopic vision 3D measurement system based on Scheimpflug condition[J]. Optics and Lasers in Engineering, 86, 83-91(2016).

[10] Fouchier M, Pargon E, Bardet B. An atomic force microscopy-based method for line edge roughness measurement[J]. Journal of Applied Physics, 113, 104903(2013).

[11] Maniscalco B, Kaminski P M, Walls J M. Thin film thickness measurements using scanning white light interferometry[J]. Thin Solid Films, 550, 10-16(2014).

[12] Berguiga L, Orobtchouk R, Elezgaray J et al. High-resolution-scanning waveguide microscopy: spatial refractive index and topography quantification[J]. Optics Letters, 42, 2523-2526(2017).

[13] Chui S T, Chen X Z, Yao Z H et al. Effect of sample anisotropy on scanning near-field optical microscope images[J]. Journal of Applied Physics, 129, 083105(2021).

[14] Yang G Y, Cai M Q, Li J Y et al. Preparation of subwavelength nanostructures based on low-energy ion bombardment[J]. Acta Optica Sinica, 40, 1736001(2020).

[15] Chen C W, Xue J P, Zhang Q C et al. Three-dimensional shape measurement of shiny surface based on multi-view equation[J]. Acta Optica Sinica, 41, 2212002(2021).

[16] Zhu J L, Liu S Y, Zhang C W et al. Identification and reconstruction of diffraction structures in optical scatterometry using support vector machine method[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 12, 013004(2013).

[17] Kucharski D, Zdunek H. A low-cost, simple optical setup for a fast scatterometry surface roughness measurements with nanometric precision[J]. Bulletin of the Polish Academy of Sciences, Technical Sciences, 68, 485-490(2020).

[18] Minkov D A, Angelov G V, Nestorov R N et al. Perfecting the dispersion model free characterization of a thin film on a substrate specimen from its normal incidence interference transmittance spectrum[J]. Thin Solid Films, 706, 137984(2020).

[19] Chen X G, Liu S Y, Zhang C W et al. Accurate measurement of templates and imprinted grating structures using Mueller matrix ellipsometry[J]. Acta Physica Sinica, 63, 180701(2014).

[20] Zhu J L. Profile reconstruction methods in optical scatterometry based nanostructure metrology[D](2015).

[21] Dong Z Q. Research on instrument measurement configuration optimization in optical scatterometry[D](2015).

[22] Li J, Shi L H, Ma Y et al. Efficient implementation of rigorous coupled-wave analysis for analyzing binary gratings[J]. IEEE Antennas and Wireless Propagation Letters, 19, 2132-2135(2020).

[23] Chen X G. Theory and method of nanostructure metrology using generalized ellipsometry[D](2013).

[24] Zhu J L, Jiang H, Shi Y T et al. Fast and accurate solution of inverse problem in optical scatterometry using heuristic search and robust correction[J]. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 33, 031807(2015).

[25] Marquardt D W. An algorithm for least-squares estimation of nonlinear parameters[J]. Journal of the Society for Industrial and Applied Mathematics, 11, 431-441(1963).

[26] Chen X G, Yuan K, Du W C et al. Large-scale nanostructure metrology using Mueller matrix imaging ellipsometry[J]. Acta Physica Sinica, 65, 070703(2016).

[27] Dong Z Q, Zhao H, Zhu J L et al. Influence of incident illumination on optical scattering measurement of typical photoresist nanostructure[J]. Acta Physica Sinica, 69, 030601(2020).

[28] Heuke S, Rigneault H. Laser scanning dark-field coherent anti-Stokes Raman scattering (DF-CARS): a numerical study[J]. Optics Express, 29, 3985-3995(2021).

[29] Chen S, En Y F, Li G Y et al. An ion beam layer removal method of determining the residual stress in the as-fabricated TSV-Cu/TiW/SiO2/Si interface on a nanoscale[J]. Microelectronics Reliability, 112, 113826(2020).

[30] Gong J B, Dai R C, Wang Z P et al. Temperature dependent optical constants for SiO2 film on Si substrate by ellipsometry[J]. Materials Research Express, 4, 085005(2017).

[31] Ji Y Q, Jiang Y G, Liu H S et al. Optical constants of SiO2 films deposited on Si substrates[J]. Chinese Physics Letters, 31, 046401(2014).

[32] Nidamanuri R R, Zbell B. A method for selecting optimal spectral resolution and comparison metric for material mapping by spectral library search[J]. Progress in Physical Geography: Earth and Environment, 34, 47-58(2010).

[33] Dong Z Q, Liu S Y, Chen X G et al. Optimization of measurement configuration in optical scatterometry for one-dimensional nanostructures based on sensitivity analysis[J]. Journal of Infrared and Millimeter Waves, 35, 116-122(2016).