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Chinese Journal of Lasers, Volume. 29, Issue 3, 286(2002)

A New Method of Resistless Photochemical Etching for Silicon Wafer

[in Chinese]1、*, [in Chinese]1, and [in Chinese]2
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  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese]. A New Method of Resistless Photochemical Etching for Silicon Wafer[J]. Chinese Journal of Lasers, 2002, 29(3): 286

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    Paper Information

    Category: laser manufacturing

    Received: Sep. 8, 2000

    Accepted: --

    Published Online: Aug. 8, 2006

    The Author Email: (stsyjie@zsu.edu.cn)

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology