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Chinese Journal of Lasers, Volume. 51, Issue 7, 0701007(2024)

High‑Power Free‑Electron Laser Sources Based on Energy Recovery Linacs for Extreme Ultraviolet Lithography

Kui Zhou, Peng Li*, Dai Wu, and Ming Li
Author Affiliations
  • Institute of Applied Electronics, Chinese Academy of Engineering Physics, Mianyang 621900, Sichuan , China
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    Figures&Tables (8)
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    References (66)
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    Figures & Tables(8)
    Basic principle of FEL[19]. (a) Low gain FEL; (b) high gain FEL

    Fig. 1. Basic principle of FEL[19]. (a) Low gain FEL; (b) high gain FEL

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    Schematic of ERL FEL light source[23]

    Fig. 2. Schematic of ERL FEL light source[23]

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    Schematic of JLab FEL facility [30]

    Fig. 3. Schematic of JLab FEL facility [30]

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    Schematic of EUV FEL light source based on ERL proposed by KEK[51]

    Fig. 4. Schematic of EUV FEL light source based on ERL proposed by KEK[51]

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    Compact ERL FEL light source for EUV lithography[55]

    Fig. 5. Compact ERL FEL light source for EUV lithography[55]

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    Schematic of infrared terahertz FEL facility of Chinese Academy of Engineering Physics [66]

    Fig. 6. Schematic of infrared terahertz FEL facility of Chinese Academy of Engineering Physics [66]

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    • Table 1. Main parameters of international ERL FEL light source facilities

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      Table 1. Main parameters of international ERL FEL light source facilities

      ParameterJLab FEL （infrared）JLab FEL （ultraviolet）Novosibirsk FEL（2nd）Novosibirsk FEL（3rd）

      Daresbury

      ALICE

      		JAEA FEL
      Energy/MeV16513521.0‒22.839‒4220.8‒35.017
      Beam current/mA102.51048.1258
      FEL wavelength/μm1‒140.25‒0.7037‒808‒115‒822
      Maximum output power/W>10000>15050010053750
      Repetition rate/MHz74.8574.85180.4180.481.2520.8
      Accelerator typeSuperconductingSuperconductingNormal-conductingNormal-conductingSuperconductingSuperconducting
      Working modeContinuous waveContinuous waveContinuous waveContinuous wavePulsePulse

    • Table 2. Main design parameters of ERL experimental platform based on infrared terahertz FEL facility of Chinese Academy of Engineering Physics

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      Table 2. Main design parameters of ERL experimental platform based on infrared terahertz FEL facility of Chinese Academy of Engineering Physics

      ParameterDesigned value
      Injector energy /MeV6‒8
      Beam energy /MeV20
      Beam current /mA1‒3
      Repetition rate /MHz27.08
      Energy recovery efficiency /%>95
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    Kui Zhou, Peng Li, Dai Wu, Ming Li. High‑Power Free‑Electron Laser Sources Based on Energy Recovery Linacs for Extreme Ultraviolet Lithography[J]. Chinese Journal of Lasers, 2024, 51(7): 0701007

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    Paper Information

    Category: laser devices and laser physics

    Received: Dec. 11, 2023

    Accepted: Feb. 22, 2024

    Published Online: Mar. 29, 2024

    The Author Email: Li Peng (burnlife@sina.com)

    DOI:10.3788/CJL231496

    CSTR:32183.14.CJL231496

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology