Laser & Optoelectronics Progress, Volume. 61, Issue 15, 1522002(2024)

Modeling of Digital Micromirror Device Diffraction Effect and Its Application in Laser Direct Writing Equipment

Lin Fang, Jian Cai*, Jialiang Ye, Wei Cai, and Qi Zhang
Author Affiliations
  • Circuit Fabology Microelectronics Equipment Co., Ltd., Hefei 230088, Anhui, China
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    References(13)

    [7] Wang K K, Wang C, Shi H D et al. Polarization aberration analysis and compensation of off-axis optical system with digital micromirror device[J]. Acta Optica Sinica, 42, 1611001(2022).

    [9] Xiong Z. Research on digital lithography technology based on DMD[D](2016).

    [12] Guo X W. Research on SLM maskless lithography technology[D](2007).

    [13] Yang Z J. Research on optimization technology of DMD maskless lithography pattern quality[D](2023).

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    Lin Fang, Jian Cai, Jialiang Ye, Wei Cai, Qi Zhang. Modeling of Digital Micromirror Device Diffraction Effect and Its Application in Laser Direct Writing Equipment[J]. Laser & Optoelectronics Progress, 2024, 61(15): 1522002

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jul. 31, 2023

    Accepted: Sep. 6, 2023

    Published Online: Aug. 8, 2024

    The Author Email: Jian Cai (jcai@cfmee.cn)

    DOI:10.3788/LOP231802

    CSTR:32186.14.LOP231802

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