Laser & Optoelectronics Progress, Volume. 61, Issue 15, 1522002(2024)

Modeling of Digital Micromirror Device Diffraction Effect and Its Application in Laser Direct Writing Equipment

Lin Fang, Jian Cai*, Jialiang Ye, Wei Cai, and Qi Zhang
Author Affiliations
  • Circuit Fabology Microelectronics Equipment Co., Ltd., Hefei 230088, Anhui, China
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    Figures & Tables(10)
    Equipment appearance diagram and DMD imaging optical path schematic diagram. (a) Appearance diagram; (b) schematic diagram of imaging optical path
    Schematic diagram of the incident light on DMD
    Blazing level curves of DLP9000 and DLP9500. (a) DLP9000; (b) DLP9500
    The DLP9000 blazing level curves under different micromirror angles and the diffraction spot power distribution of the same model DMD chip. (a) Blazing level curve; (b) diffraction spot power distribution
    Diffraction spot in the Fourier plane and image pattern in the image plane. (a) Distribution of diffraction spot @d=7.56 μm; (b) distribution of diffraction spot @d=10.8 μm; (c) image pattern @d=7.56 μm; (d) image pattern @d=10.8 μm
    Processing diagram of the DMD diffraction model
    Diffraction spot distribution and image quality map of DLP9000. (a) Before adjusting the angle; (b) after adjusting the angle; (c) before adjusting the angle; (d) after adjusting the angle
    Exposure patterns of different image contrast. (a) Exposure pattern of Fig.7(a); (b) exposure pattern of Fig.7(b)
    • Table 1. Linewidth of exposure pattern of different Z position at initial incident angle

      View table

      Table 1. Linewidth of exposure pattern of different Z position at initial incident angle

      Z position /mmTransverse line /μmVertical line /μm
      LeftMiddleRightLeftMiddleRight
      -1.5516.8216.9517.0215.9216.0215.56
      -1.6516.4516.3216.4515.6815.3615.04
      -1.7516.3215.6816.3215.6813.7616.32
      -1.8516.0016.3216.0015.6814.415.36
      -1.9516.6816.9816.9516.0515.5815.66
    • Table 2. Linewidth of exposure pattern of different Z position at adjusted incident angle

      View table

      Table 2. Linewidth of exposure pattern of different Z position at adjusted incident angle

      Z position /mmTransverse line /μmVertical line /μm
      LeftMiddleRightLeftMiddleRight
      -1.4516.5516.6016.5815.9015.6615.80
      -1.5515.3615.0415.0415.6815.3614.72
      -1.6516.4416.0816.0814.9814.6215.35
      -1.7515.6816.3215.0415.3515.0414.62
      -1.8516.0014.7215.6815.0415.0414.48
      -1.9516.3214.7216.3214.414.414.72
      -2.0516.8516.9216.8815.9015.8415.06
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    Lin Fang, Jian Cai, Jialiang Ye, Wei Cai, Qi Zhang. Modeling of Digital Micromirror Device Diffraction Effect and Its Application in Laser Direct Writing Equipment[J]. Laser & Optoelectronics Progress, 2024, 61(15): 1522002

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jul. 31, 2023

    Accepted: Sep. 6, 2023

    Published Online: Aug. 8, 2024

    The Author Email: Jian Cai (jcai@cfmee.cn)

    DOI:10.3788/LOP231802

    CSTR:32186.14.LOP231802

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