Chinese Journal of Lasers, Volume. 14, Issue 4, 225(1987)
Amorphous Si: H film grown by laser plasma induced chemical vapour deposition
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Li Zhaolin, Zhang Zebo, Hong Xichun, Zhao Yuying, Wang Tianjuan. Amorphous Si: H film grown by laser plasma induced chemical vapour deposition[J]. Chinese Journal of Lasers, 1987, 14(4): 225
Paper Information
Category: laser devices and laser physics
Received: Feb. 13, 1986
Accepted: --
Published Online: Aug. 10, 2012
The Author Email:
CSTR:32186.14.
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