Chinese Journal of Lasers, Volume. 14, Issue 4, 225(1987)
Amorphous Si: H film grown by laser plasma induced chemical vapour deposition
Figures & Tables(0)
Tools
Get Citation
Copy Citation Text
Li Zhaolin, Zhang Zebo, Hong Xichun, Zhao Yuying, Wang Tianjuan. Amorphous Si: H film grown by laser plasma induced chemical vapour deposition[J]. Chinese Journal of Lasers, 1987, 14(4): 225
Paper Information
Category: laser devices and laser physics
Received: Feb. 13, 1986
Accepted: --
Published Online: Aug. 10, 2012
The Author Email:
CSTR:32186.14.
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20