Preliminary study of the damage resistance of type I doubler KDP crystals at 532  nm

Yinbo Zheng; Lei Ding; Xinda Zhou; Rongsheng Ba; Jing Yuan; Honglei Xu; Xiaoyu Yang; Bo Chen; Jin Na; Yajun Li; Wanguo Zheng

doi:10.3788/COL201614.051601

Chinese Optics Letters, Volume. 14, Issue 5, 051601(2016)

Preliminary study of the damage resistance of type I doubler KDP crystals at 532 nm

Yinbo Zheng, Lei Ding^*, Xinda Zhou, Rongsheng Ba, Jing Yuan, Honglei Xu, Xiaoyu Yang, Bo Chen, Jin Na, Yajun Li, and Wanguo Zheng

Author Affiliations

Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China

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Yinbo Zheng, Lei Ding, Xinda Zhou, Rongsheng Ba, Jing Yuan, Honglei Xu, Xiaoyu Yang, Bo Chen, Jin Na, Yajun Li, Wanguo Zheng, "Preliminary study of the damage resistance of type I doubler KDP crystals at 532 nm," Chin. Opt. Lett. 14, 051601 (2016)

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Paper Information

Category: Materials

Received: Dec. 23, 2015

Accepted: Feb. 23, 2016

Published Online: Aug. 6, 2018

The Author Email: Lei Ding (dingleigongyong@126.com)

DOI:10.3788/COL201614.051601

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology