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Acta Optica Sinica, Volume. 37, Issue 10, 1022001(2017)

Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm

Lei Wang1,2, Sikun Li1,2, Xiangzhao Wang1,2、*, and Chaoxing Yang1
Author Affiliations
  • 1 Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2 University of Chinese Academy of Sciences, Beijing 100049, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (14)
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    References (39)
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    Figures & Tables(14)
    Schematic diagram of lithography imaging system

    Fig. 1. Schematic diagram of lithography imaging system

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    Schematic of (a) source encoding and (b) mask encoding

    Fig. 2. Schematic of (a) source encoding and (b) mask encoding

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    Projector pupil phase distribution. (a) z4; (b) z9; (c) z16; (d) z25; (e) z36; (f) fitting projector pupil

    Fig. 3. Projector pupil phase distribution. (a) z4; (b) z9; (c) z16; (d) z25; (e) z36; (f) fitting projector pupil

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    Flowcharts of SMPO method using PSO algorithm. (a) General flowchart; (b) sub-flowcharts

    Fig. 4. Flowcharts of SMPO method using PSO algorithm. (a) General flowchart; (b) sub-flowcharts

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    (a) Initial source; (b) initial mask; (c) initial projector pupil; (d) initial photoresist image in nominal condition

    Fig. 5. (a) Initial source; (b) initial mask; (c) initial projector pupil; (d) initial photoresist image in nominal condition

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    (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image in nominal condition

    Fig. 6. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image in nominal condition

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    Convergence curve in nominal condition

    Fig. 7. Convergence curve in nominal condition

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    (a) Initial projector pupil; (b) initial photoresist image in process condition

    Fig. 8. (a) Initial projector pupil; (b) initial photoresist image in process condition

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    (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image in process condition

    Fig. 9. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image in process condition

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    Convergence curve in process condition

    Fig. 10. Convergence curve in process condition

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    Optimal results of SMO method based on PSO algorithm. (a) Optimized source; (b) optimized mask; (c) optimized photoresist image; (d) convergence curve

    Fig. 11. Optimal results of SMO method based on PSO algorithm. (a) Optimized source; (b) optimized mask; (c) optimized photoresist image; (d) convergence curve

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    Optimal results without data compression of the mask pattern. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized resist image

    Fig. 12. Optimal results without data compression of the mask pattern. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized resist image

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    Optimal results of SMPO method based on genetic algorithm. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image

    Fig. 13. Optimal results of SMPO method based on genetic algorithm. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image

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    Convergence curves of SMPO methods based on GA and PSO algorithm

    Fig. 14. Convergence curves of SMPO methods based on GA and PSO algorithm

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    Lei Wang, Sikun Li, Xiangzhao Wang, Chaoxing Yang. Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm[J]. Acta Optica Sinica, 2017, 37(10): 1022001

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Apr. 10, 2017

    Accepted: --

    Published Online: Sep. 7, 2018

    The Author Email: Xiangzhao Wang (wxz26267@siom.ac.cn)

    DOI:10.3788/AOS201737.1022001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology