Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm

Lei Wang; Sikun Li; Xiangzhao Wang; Chaoxing Yang

doi:10.3788/AOS201737.1022001

Acta Optica Sinica, Volume. 37, Issue 10, 1022001(2017)

Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm

Lei Wang^1,2, Sikun Li^1,2, Xiangzhao Wang^1,2、*, and Chaoxing Yang¹

¹ Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

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Lei Wang, Sikun Li, Xiangzhao Wang, Chaoxing Yang. Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm[J]. Acta Optica Sinica, 2017, 37(10): 1022001

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Paper Information

Category: Optical Design and Fabrication

Received: Apr. 10, 2017

Accepted: --

Published Online: Sep. 7, 2018

The Author Email: Xiangzhao Wang (wxz26267@siom.ac.cn)

DOI:10.3788/AOS201737.1022001

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