Fig. 1. Schematic of experimental setup

Fig. 2. (a)(c) FESEM morphologies and (b)(d) OIM images of Si (111) surface irradiated by femtosecond lasers with different pulse energies

Fig. 3. (a)(c) FESEM morphologies and (b)(d) OIM images of Si (111) surface irradiated by femtosecond lasers with different pulse energies

Fig. 4. IQ images of Si surfaces irradiated by femtosecond lasers with different pulse energies. (a) (111) surface; (b) (100) surface

Fig. 5. Si (111) surface irradiated by femtosecond laser with pulse energy of 40 μJ. (a) Surface topography of sample; (b) energy spectra of samples

Fig. 6. Atomic distribution diagrams of monocrystal Si (100) and (111) surfaces