[1] Bude J, Carr C W, Miller P E et al. Particle damage sources for fused silica optics and their mitigation on high energy laser systems[J]. Optics Express, 25, 11414-11435(2017).

[2] Zheng W G, Zu X T, Yuan X D[M]. Damage resistance and physical problems of high power laser facilities, 19-23(2014).

[3] Shi F, Shu Y, Song C et al. Advances in shape controllable and property controllable manufacturing technology for ultraviolet fused silica components with high precision and few defects[J]. High Power Laser and Particle Beams, 32, 032002(2020).

[4] Ye X, Huang J, Wang F R et al. Laser damage precursors in fused silica and mitigation process[J]. High Power Laser and Particle Beams, 25, 3220-3224(2013).

[5] Ye X, Huang J, Liu H et al. Advanced mitigation process (AMP) for improving laser damage threshold of fused silica optics[J]. Scientific Reports, 6, 31111(2016).

[6] Bercegol H, Grua P. Fracture related initiation and growth of surface laser damage in fused silica[J]. Proceedings of SPIE, 7132, 71321B(2008).

[7] Li Y G, Zheng N, Li H B et al. Morphology and distribution of subsurface damage in optical fused silica parts: bound-abrasive grinding[J]. Applied Surface Science, 257, 2066-2073(2011).

[8] Stevens-Kalceff M A, Stesmans A, Wong J. Defects induced in fused silica by high fluence ultraviolet laser pulses at 355 nm[J]. Applied Physics Letters, 80, 758-760(2002).

[9] Wang J, Li Y G, Han J H et al. Evaluating subsurface damage in optical glasses[J]. Journal of European Optical Society-Rapid Publications, 6, 11001(2011).

[10] Wang J, Li Y G, Yuan Z G et al. Producing fused silica optics with high UV-damage resistance to nanosecond pulsed lasers[J]. Proceedings of SPIE, 9532, 95320H(2015).

[11] Genin F Y, Michlitsch K, Furr J et al. Laser-induced damage of fused silica at 355 and 1064 nm initiated at aluminum contamination particles on the surface[J]. Proceedings of SPIE, 2966, 126-138(1997).

[12] Ye H, Li Y G, Zhang Q H et al. Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers[J]. Applied Optics, 55, 3017-3025(2016).

[13] Miller P E, Bude J D, Suratwala T I et al. Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces[J]. Optics Letters, 35, 2702-2704(2010).

[14] Zhao D F, Wu R, Lin Z Q et al. Acid etching combined with ultrasonic for improving laser damage threshold of fused silica[J]. High Power Laser and Particle Beams, 27, 012001(2015).

[15] Zheng Z. Study of HF etching on fused silica[D], 7-14(2011).

[16] Yan X. Study on the effect of ultrasonic-assisted HF etching technique on the manufacture of defect-free optic surface[D], 8-9(2013).

[17] Wong L, Suratwala T, Feit M D et al. The effect of HF/NH4F etching on the morphology of surface fractures on fused silica[J]. Journal of Non-Crystalline Solids, 355, 797-810(2009).

[18] Liu H J, Ye X, Zhou X D et al. Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process[J]. Optical Materials, 36, 855-860(2014).

[19] Huang J, Zhou X D, Liu H J et al. Influence of subsurface defects on damage performance of fused silica in ultraviolet laser[J]. Optical Engineering, 52, 024203(2013).

[20] da Costa Fernandes B, Pfiffer M, Cormont P et al. Understanding the effect of wet etching on damage resistance of surface scratches[J]. Scientific Reports, 8, 1337(2018).

[21] Wang F R, Zheng Z, Liu H J et al. Mechanisms of HF solution improving damage properties of fused silica subsurface cracks[J]. Acta Photonica Sinica, 41, 253-257(2012).

[22] Jiang X L. Investigation on processing of fused silica substrate used in high power laser system[D], 13-31(2015).

[23] Manes K R, Spaeth M L, Adams J J et al. Damage mechanisms avoided or managed for NIF large optics[J]. Fusion Science and Technology, 69, 146-249(2016).

[24] Pfiffer M, Cormont P, Néauport J et al. Effects of chemical etching on the surface quality and the laser induced damage threshold of fused silica optics[J]. Proceedings of SPIE, 10014, 1001405(2016).

[25] Pfiffer M, Cormont P, Fargin E et al. Effects of deep wet etching in HF/HNO3 and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm[J]. Optics Express, 25, 4607-4620(2017).

[26] Bude J, Miller P E, Shen N et al. Silica laser damage mechanisms, precursors, and their mitigation[J]. Proceedings of SPIE, 9237, 92370S(2014).

[27] Zhang J P, Sun H Y, Wang S L et al. Three-dimensional reconstruction technology of subsurface defects in fused silica optical components[J]. Acta Optica Sinica, 40, 0216001(2020).

[28] Li H L, Liu H J, Jiang X D et al. Subsurface defects in fused silica elements detected by fluorescence imaging technology[J]. Laser & Optoelectronics Progress, 56, 011004(2019).

[29] Tang W L, Liang S J, Jiao X et al. Formation and control of scratches on surfaces of optical components during polishing[J]. Chinese Journal of Lasers, 46, 1202009(2019).

[30] Wang H R, Chen Z, Xiao H P et al. Combined modulation to incident laser by subsurface crack and contaminant on fused silica[J]. Proceedings of SPIE, 10713, 1071312(2018).

[31] Chen Z, Xiao H P, Li Z B et al. Laser modulation simulation of micro-crack morphology evolution during chemical etching[J]. Proceedings of SPIE, 11063, 110631H.

[32] Zhang L, Chen W, Hu L L. Systematic investigation on light intensification by typical subsurface cracks on optical glass surfaces[J]. Applied Optics, 52, 980-989(2013).

[33] Xu J F. Study on the post-processing technique of fused silica[D], 13-16(2015).

[34] Cheng J, Wang J H, Zhang P Y et al. Experimental study on HF etching of fused silica[J]. High Power Laser and Particle Beams, 29, 111001(2017).

[35] Shu Y. Study on etching process of fused silica with concentrated HF[J]. Optik, 178, 544-549(2019).

[36] Suratwala T I, Miller P E, Bude J D et al. HF-based etching processes for improving laser damage resistance of fused silica optical surfaces[J]. Journal of the American Ceramic Society, 94, 416-428(2011).

[37] Wang Z Q, Yang K, Li Y et al. Effect of static/dynamic etching on surface quality and laser-induced damage of fused silica[J]. Journal of Applied Optics, 38, 837-843(2017).

[38] Yuan Z G, Li Y G, Chen X H et al. Effect of chemical modification technology laser damage threshold of fused silica optical elements[J]. Optics and Precision Engineering, 24, 2956-2961(2016).

[39] Xiao H P, Wang H R, Fu G L et al. Surface roughness and morphology evolution of optical glass with micro-cracks during chemical etching[J]. Applied Optics, 56, 702-711(2017).

[40] Cheng J, Wang J H, Hou J et al. Effect of polishing-induced subsurface impurity defects on laser damage resistance of fused silica optics and their removal with HF acid etching[J]. Applied Sciences, 7, 838(2017).

[41] Liu T X, Yang K, Zhang Z et al. Hydrofluoric acid-based etching effect on surface pit, crack, and scratch and laser damage site of fused silica optics[J]. Optics Express, 27, 10705-10728(2019).

[42] Ye H, Li Y G, Yuan Z G et al. Laser induced damage characteristics of fused silica optics treated by wet chemical processes[J]. Applied Surface Science, 357, 498-505(2015).

[43] Yin Y C. Study on the formation mechanism of the redeposit in the acid etching on fused silica[D], 35-39(2016).

[44] Wang Z Q, Yan H W, Yuan X D et al. Formation of redeposit in chemical etching process of fused silica and its effect on laser-induced damage[J]. High Power Laser and Particle Beams, 29, 5-10(2017).

[45] Ye H, Li Y G, Xu Q et al. Effects of wet chemical etching on scratch morphology and laser damage resistance of fused silica[J]. Silicon, 12, 425-432(2020).

[46] Ye H, Li Y G, Yuan Z G et al. Improving UV laser damage threshold of fused silica optics by wet chemical etching technique[J]. Proceedings of SPIE, 9532, 953221(2015).

[47] Wang H X, Shen L, Li C F et al. Analysis and experimental investigation of laser induced damage of optics[J]. Chinese Journal of Lasers, 44, 0302006(2017).

[48] Ye H, Li Y G, Jiang C et al. Processing fused silica with wet chemical technology[J]. Optics and Precision Engineering, 28, 382-389(2020).

[49] Ma B, Lu M L, Zhan G D et al. Effect of etching morphology of artificial defect on laser-induced damage properties under 355  nm laser irradiation[J]. Applied Optics, 54, 3365-3371(2015).

[50] Bude J, Miller P, Baxamusa S et al. High fluence laser damage precursors and their mitigation in fused silica[J]. Optics Express, 22, 5839-5851(2014).

[51] Baxamusa S, Miller P E, Wong L et al. Mitigation of organic laser damage precursors from chemical processing of fused silica[J]. Optics Express, 22, 29568-29577(2014).

[52] Li Y, Yan H W, Yang K et al. Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching[J]. Chinese Physics B, 26, 118104(2017).

[53] Cormont P, Pfiffer M, Fargin E et al. Wet chemical etching with KOH solutions for fused silica optics manufacturing[C], OTu1B.3(2017).

[54] Sun L X, Shao T, Zhou X D et al. KOH-based shallow etching for exposing subsurface damage and increasing laser damage resistance of fused silica optical surface[J]. Optical Materials, 108, 110249(2020).

[55] Li Y. Improvement of laser damage resistance of fused silica optics by hydrofluoric acid etching[D], 53-55(2018).

[56] Shi F, Zhong Y Y, Dai Y F et al. Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during ion beam etching of fused silica[J]. Optics Express, 24, 20842-20854(2016).

[57] Zhong Y Y, Dai Y F, Shi F et al. Effects of ion beam etching on the nanoscale damage precursor evolution of fused silica[J]. Materials, 13, 1294-1306(2020).

[58] Sun L X, Liu H J, Huang J et al. Reaction ion etching process for improving laser damage resistance of fused silica optical surface[J]. Optics Express, 24, 199-211(2016).

[59] Shao T, Sun L X, Li W H et al. Understanding the role of fluorine-containing plasma on optical properties of fused silica optics during the combined process of RIE and DCE[J]. Optics Express, 27, 23307-23320(2019).

[60] Sun L X, Huang J, Liu H J et al. Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces[J]. Optics Letters, 41, 4464-4467(2016).

[61] Sun L X, Huang J, Shao T et al. Effects of combined process of reactive ion etching and dynamic chemical etching on UV laser damage resistance and surface quality of fused silica optics[J]. Optics Express, 26, 18006-18018(2018).

[62] Sun L X, Shao T, Xu J F et al. Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching[J]. RSC Advances, 8, 32417-32422(2018).

[63] Shi F, Tian Y, Peng X Q et al. Combined technique of elastic magnetorheological finishing and HF etching for high-efficiency improving of the laser-induced damage threshold of fused silica optics[J]. Applied Optics, 53, 598-604(2014).

[64] Xu M J, Shi F, Zhou L et al. Investigation of laser-induced damage threshold improvement mechanism during ion beam sputtering of fused silica[J]. Optics Express, 25, 29260-29271(2017).