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Acta Optica Sinica, Volume. 39, Issue 12, 1222001(2019)

Influence of Optical System Aberration on Critical Dimension of EUV Lithography Imaging

Ruifeng Ming1, Yayi Wei1,2、*, and Lisong Dong2
Author Affiliations
  • 1School of Microelectronics, University of Chinese Academy of Sciences, Beijing 100049, China
  • 2Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
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    Article index updated: Mar. 10, 2025

    The article is cited by 2 article(s) CLP online library. (Some content might be in Chinese.)
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    Ruifeng Ming, Yayi Wei, Lisong Dong. Influence of Optical System Aberration on Critical Dimension of EUV Lithography Imaging[J]. Acta Optica Sinica, 2019, 39(12): 1222001

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    Paper Information

    Category: Optical Design and Fabrication

    Received: May. 22, 2019

    Accepted: Jul. 29, 2019

    Published Online: Dec. 6, 2019

    The Author Email: Wei Yayi (weiyayi@ime.ac.cn)

    DOI:10.3788/AOS201939.1222001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology