Chinese Journal of Lasers, Volume. 44, Issue 9, 906002(2017)

Line Beam Shaping System for Preparation of Low Temperature Poly-Silicon

Yin Guangyue1,2、*, You Libing1, Wang Qingsheng1, Chu Zhuangzhuang1,2, Chen Liang1,2, and Fang Xiaodong1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    Figures & Tables(15)
    Schematic of beam homogenizing based on lens array
    Schematic of line beam shaping system
    Structure of laser transmitting arm
    Photograph of long axis lens array
    (a) Mechanical structure and (b) optical structure of lens
    (a) Energy distribution curve of long axis; (b) energy distribution curve of short axis; (c) simulated spot
    Simulated long axis energy distributions of line spots. (a) Energy distribution without center error; (b) energy distribution with center error in the range of [-0.1 mm, 0.1 mm]; (c) energy distribution with center error in the range of [-0.3 mm, 0.3 mm]; (d) energy distribution with center error in the range of [-0.5 mm, 0.5 mm]
    Relationship between center error of long axis lens array and size of line spot
    Simulated short axis energy distributions of line spots. (a) Energy distribution with actual working plane deviation of -2 mm; (b) energy distribution with actual working plane deviation of -1 mm; (c) energy distribution without deviation; (d) energy distribution with actual working plane deviation of 1 mm; (e) energy distribution with actual working plane deviation of 2 mm
    Relationship among deviation of actual working plane, spot size of short axis and energy density
    Photographs of line spots on different materials. (a) Line spot on heat-sensitive photo paper; (b) partial line spot on heat-sensitive photo paper under optical microscope; (c) partial line spot on oxidized and blackened aluminum under optical microscope
    Schematic of major structure of beam analyzer
    (a) Measured partial line spot; (b) energy distribution of long axis; (c) energy distribution of short axis
    SEM images and XRD spectra of amorphous silicon before and after annealing process by line beam. (a) XRD spectrum before annealing process; (b) XRD spectrum after annealing process; (c) SEM image before annealing process; (d) SEM image after annealing process
    • Table 1. Energy transfer efficiency of system

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      Table 1. Energy transfer efficiency of system

      PositionEnergy /mJEnergy transfer efficiency /%
      Output mirror429
      Before beam conversion module39291
      Before expander and homogenizer33585
      Before reflector22968
      Before projection lens21092
      Work piece14067
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    Yin Guangyue, You Libing, Wang Qingsheng, Chu Zhuangzhuang, Chen Liang, Fang Xiaodong. Line Beam Shaping System for Preparation of Low Temperature Poly-Silicon[J]. Chinese Journal of Lasers, 2017, 44(9): 906002

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    Paper Information

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    Received: Mar. 29, 2017

    Accepted: --

    Published Online: Sep. 7, 2017

    The Author Email: Guangyue Yin (378575080@qq.com)

    DOI:10.3788/CJL201744.0906002

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