Chinese Journal of Lasers, Volume. 9, Issue 8, 520(1982)
An ArF excimer laser at 193 nm
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Shangguan Cheng, Yuan Cailai, Te Chao, Dou Airong. An ArF excimer laser at 193 nm[J]. Chinese Journal of Lasers, 1982, 9(8): 520
Paper Information
Category: laser devices and laser physics
Received: Jun. 26, 1981
Accepted: --
Published Online: Aug. 23, 2012
The Author Email:
CSTR:32186.14.
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