Chinese Journal of Lasers, Volume. 9, Issue 8, 520(1982)
An ArF excimer laser at 193 nm
In this paper an improved ArF excimer laser at 193 nm is reported. The single pulse output energy is over 200mj. The effect of UV-preionization on the laser output performances is discussed in detail.
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Shangguan Cheng, Yuan Cailai, Te Chao, Dou Airong. An ArF excimer laser at 193 nm[J]. Chinese Journal of Lasers, 1982, 9(8): 520
Paper Information
Category: laser devices and laser physics
Received: Jun. 26, 1981
Accepted: --
Published Online: Aug. 23, 2012
The Author Email:
CSTR:32186.14.
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