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Chinese Journal of Lasers, Volume. 51, Issue 12, 1202406(2024)

Review and Challenges of Photosensitive Materials in Two‑Photon Lithography (Invited)

Yun Dong, Xiangming He, and Hong Xu*
Author Affiliations
  • Institute of Nuclear and New Energy Technology, Tsinghua University, Beijing 100084, China
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    Yun Dong, Xiangming He, Hong Xu. Review and Challenges of Photosensitive Materials in Two‑Photon Lithography (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202406

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    Paper Information

    Category: Laser Micro-Nano Manufacturing

    Received: Feb. 20, 2024

    Accepted: Apr. 8, 2024

    Published Online: May. 29, 2024

    The Author Email: Xu Hong (hongxu@tsinghua.edu.cn)

    DOI:10.3788/CJL240602

    CSTR:32183.14.CJL240602

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology